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Fabrication of diffraction grating for X-ray Talbot interferometer

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Abstract

Imaging technology using the phase data attracts attention from many researchers as the observation technique of a biomechanical material. We produced a diffraction grating for obtaining high-resolution phase data. We designed the new process flow and developed the fabrication technique composed of MEMS technology, X-ray lithography, and micro electroplating. The X-ray lithography process was performed using the NewSUBARU synchrotron radiation facility. The line and the aspect ratio of this grating were 4 μm and above 5 μm, respectively. We evaluated the diffraction grating in SPring-8.

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Acknowledgment

This research was supported financially by Japan Science and technology agency (JST).

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Correspondence to Masatake Matsumoto.

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Matsumoto, M., Takiguchi, K., Tanaka, M. et al. Fabrication of diffraction grating for X-ray Talbot interferometer. Microsyst Technol 13, 543–546 (2007). https://doi.org/10.1007/s00542-006-0226-8

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  • DOI: https://doi.org/10.1007/s00542-006-0226-8

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