Abstract
Using direct-write atom lithography, Fe nanolines are deposited with a pitch of 186 nm, a full width at half maximum (FWHM) of 50 nm, and a height of up to 6 nm. These values are achieved by relying on geometrical collimation of the atomic beam, thus without using laser collimation techniques. This opens the way for applying direct-write atom lithography to a wide variety of elements.
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Smeets, B., van der Straten, P., Meijer, T. et al. Atom lithography without laser cooling. Appl. Phys. B 98, 697–705 (2010). https://doi.org/10.1007/s00340-009-3867-3
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DOI: https://doi.org/10.1007/s00340-009-3867-3