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Improving the electrical and optical properties of CuCrO2 thin film deposited by reactive RF magnetron sputtering in controlled N2/Ar atmosphere

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Abstract

In this paper, we have investigated the influence of N2 reactive gas on the structural, electrical and optical properties of CuCrO2 thin film deposited on the quartz substrate using RF magnetron sputtering. The introduction of nitrogen into the structure of CuCrO2 thin film clearly improves the electrical and optical properties of the material due to the addition of more charge carriers. The obtained results clearly show that transparency in the visible region and electrical resistivity of the prepared CuCrO2 thin film with N2/(Ar + N2) ratio of 40% are about 73% and 53.0 Ω cm, respectively, which are considerably improved in comparison with the pure CuCrO2 thin film.

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Acknowledgements

We gratefully acknowledge the financial support from the Iran National Science Foundation (INSF), under Grant number 95833328. We also thank Mr. S. Javadi Anaghizi in central laboratory of Shahid Beheshti University for his extensive help in electron microscopy.

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Authors and Affiliations

  1. Laser and Plasma Research Institute, Shahid Beheshti University, G.C., Evin, Tehran, 1983969411, Iran

    Morteza Ahmadi, Morteza Asemi & Majid Ghanaatshoar

  2. Solar Cells Research Group, Shahid Beheshti University, G.C., Evin, Tehran, 1983969411, Iran

    Morteza Ahmadi, Morteza Asemi & Majid Ghanaatshoar

Authors
  1. Morteza Ahmadi
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  2. Morteza Asemi
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  3. Majid Ghanaatshoar
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Correspondence to Majid Ghanaatshoar.

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Ahmadi, M., Asemi, M. & Ghanaatshoar, M. Improving the electrical and optical properties of CuCrO2 thin film deposited by reactive RF magnetron sputtering in controlled N2/Ar atmosphere. Appl. Phys. A 124, 529 (2018). https://doi.org/10.1007/s00339-018-1945-2

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  • DOI: https://doi.org/10.1007/s00339-018-1945-2

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