Abstract
A method for the deposition of molybdenum oxide (\(\hbox {MoO}_{x}\)) with high growth rates at temperatures below 200 \(^{\circ }\text {C}\) based on plasma-enhanced atomic layer deposition is presented. The stoichiometry of the over-stoichiometric \(\hbox {MoO}_{x}\) films can be adjusted by the plasma parameters. First results of these layers acting as hole-selective contacts in silicon heterojunction solar cells are presented and discussed.
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Acknowledgments
The authors would like to thank Kerstin Jacob and Mona Wittig for wafer cleaning. J. Ziegler acknowledges Martin Bivour (Fraunhofer Institute for Solar Energy Systems) for valuable discussions. Financial support was provided by the European Commission through the FP7-ENERGY Project HERCULES (Grant Agreement No. 608498) and from the German Federal Ministry of Education and Research (BMBF) within the research college STRUKTURSOLAR.
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Ziegler, J., Mews, M., Kaufmann, K. et al. Plasma-enhanced atomic-layer-deposited MoO x emitters for silicon heterojunction solar cells. Appl. Phys. A 120, 811–816 (2015). https://doi.org/10.1007/s00339-015-9280-3
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DOI: https://doi.org/10.1007/s00339-015-9280-3