Abstract
Ion implantation was used to locally modify the surface of silica glass to create periodic plasmonic microstructures with Cu nanoparticles. Nanoparticles were synthesized by Cu-ion irradiation of the silica glass at the ion energy of 40 keV, dose of 5×1016 ions/cm2 and current density of 5 μA/cm2. This procedure involves low-energy ion implantation into the glass through a mask placed at the surface. Formation of nanoparticles was observed by optical spectroscopy and atomic force microscopy. The presented results clearly demonstrate how the low-energy ions can be used for the fabrication of photonic microstructures on dielectric surfaces in a single-step process.
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Acknowledgements
A.L.S. grateful to the Alexander von Humboldt Foundation and the DAAD (Germany). Also, this work was partly supported by the Russian Foundation for Basic Research (Nos. 11-02-91341, 11-02-90420, 12-02-97029 and 12-02-00528) and DFG (Germany) (No. CH 179/22-1). T.S.K. was supported by the State Fund for Fundamental Researches of Ukraine (No. 40.2/019). We would like to thank Dr. V.N. Popok from Aalborg University for the help with AFM measurements.
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Stepanov, A.L., Galyautdinov, M.F., Evlyukhin, A.B. et al. Synthesis of periodic plasmonic microstructures with copper nanoparticles in silica glass by low-energy ion implantation. Appl. Phys. A 111, 261–264 (2013). https://doi.org/10.1007/s00339-012-7474-5
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DOI: https://doi.org/10.1007/s00339-012-7474-5