Abstract
Four different liquid metal ion sources (LMIS), working with pure Bi as well as with Bi containing alloys (Au13Bi87, Ga38Bi62, Ga35Bi60Li5) were investigated with respect to the emission behavior as a function of current and temperature, the mass spectra and the energy distribution of the individual ion species. Additionally, for the pure Bi-LMIS the sputtering rates for Bi ions and clusters on Si, SiO2 and Ge substrates were compared with that of Ga projectile ions using a mass separating focused ion beam system.
Similar content being viewed by others
References
J. Orloff, M. Utlaut, L. Swanson, High Resolution Focused Ion Beams (Kluwer Academic/Plenum, New York, 2003)
V.N. Tondare, J. Vac. Sci. Technol. A 23, 1498 (2005)
L.W. Swanson, Nucl. Instrum. Methods Phys. Res. 218, 347 (1983)
P. Mazarov, A. Melnikov, R. Wernhardt, A.D. Wieck, Appl. Surf. Sci. 254, 7401 (2008)
L. Bischoff, W. Pilz, T. Ganetsos, R.G. Forbes, Ch. Akhmadaliev, Ultramicroscopy 107, 865 (2007)
L. Bischoff, Ch. Akhmadaliev, J. Phys., D Appl. Phys. 41, 052001 (2008)
W.P. Hsieh, B.L. Sheu, Y.L. Wang, Appl. Phys. Lett. 83, 2277 (2003)
F.M. Green, F. Kollmer, E. Niehuis, I.S. Gilmore, M.P. Seah, Rapid Commun. Mass Spectrom. 22, 2602 (2008)
F. Kollmer, Appl. Surf. Sci. 231/232, 153 (2004)
A. Wagner, T.M. Hall, J. Vac. Sci. Technol. 16, 1871 (1979)
S. Bouneau, S. Della-Negra, J. Jacquet, Y. LeBeyec, J.P. Mouffron, A. Novikov, M. Pautrat, Nucl. Instrum. Methods Phys. Res. B 225, 579 (2004)
L. Bischoff, J. Teichert, S. Hausmann, T. Ganetsos, G.L.R. Mair, Nucl. Instrum. Methods Phys. Res. B 161–163, 1128 (2000)
P.D. Prewett, G.L.R. Mair, Focused Ion Beams from Liquid Metal Ion Sources (Research Studies Press Ltd., Taunton, Somerset, 1991)
D.R. Kingham, L.W. Swanson, Appl. Phys. A 34, 123 (1984)
L.W. Swanson, Appl. Surf. Sci. 76/77, 80 (1994)
E.W. Mueller, J. Appl. Phys. 27, 474 (1956)
D.G. Brandon, Surf. Sci. 3, 1 (1964)
L.W. Swanson, D.R. Kingham, Appl. Phys. A 41, 223 (1986)
R. Hornsey, T. Ishitani, Jpn. J. Appl. Phys. 29, 2116 (1990)
J. Van de Walle, P. Joyes, Phys. Rev. B 35, 5509 (1987)
W. Knauer, Optik 59, 335 (1981)
Y.G. Kim, Y.S. Kim, E.H. Choi, S.O. Kang, G. Cho, H.S. Uhm, J. Phys., D Appl. Phys. 31, 3463 (1998)
L.W. Swanson, G.A. Schwind, A.E. Bell, J.E. Brady, J. Vac. Sci. Technol. 16, 1864 (1979)
T. Ishitani, K. Umemura, Y. Kawanami, J. Appl. Phys. 61, 748 (1987)
P. Schneider, L. Bischoff, J. Teichert, E. Hesse, Nucl. Instrum. Methods Phys. Res. B 117, 77 (1996)
S. Habenicht, K.P. Lieb, J. Koch, A.D. Wieck, Phys. Rev. B 65, 115327 (2002)
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Bischoff, L., Pilz, W., Mazarov, P. et al. Comparison of bismuth emitting liquid metal ion sources. Appl. Phys. A 99, 145–150 (2010). https://doi.org/10.1007/s00339-010-5597-0
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s00339-010-5597-0