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High-speed dicing of silicon wafers conducted using ultrathin blades

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Abstract

High-speed dicing tests were conducted for silicon wafers using developed ultrathin electroplated diamond blades with metal bond. Chipping and kerf widths of 1.5 and 28 μm, respectively, are achieved by the developed ultrathin diamond blades. The calculated maximum undeformed chip thickness varied from 9.6 to 25.5 nm for various high-speed dicing conditions. The variation tendency between experimental chip width induced by three diamond blades and corresponding calculated maximum undeformed chip thickness is consistent. Scanning electron microscopy showed that the microstructure of diamond dicing blades significantly affected the chip width.

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References

  1. Ganesh VP, Lee C (2006) Overview and emerging challenges in mechanical dicing of silicon wafers. 8th Electronics Packaging Technology Conference, Singapore, 15–21

  2. Thompson DL, Haubrich GJ (2003) Implantable medical device incorporating miniaturized circuit model. US Patent 6567703

  3. Sun JN, Gidley DW, Dull TL, Frieze WE, Yee AF, Ryan ET, Lin S, Wetzel J (2001) Probing diffusion barrier integrity on porous silica low-k thin films using positron annihilation lifetime spectroscopy. J Appl Phys 89(9):5138–5144

    Article  Google Scholar 

  4. Hye KJ, Lee HB, Tsukasa M, Jung E, Yun JH, Lee JM, Choi GH, Choi S, Chung C (2011) Formation of highly reliable Cu/low-k interconnects by using CVD Co barrier in dual damascene structures. IEEE International Reliability Physics Symposium (IRPS 2011), Monterey, CA, USA, 10-14 April, 3E.2

  5. Hussein MA, He J (2005) Materials' impact on interconnect process technology and reliability. IEEE Trans Semicond Manuf 18(1):69–85

    Article  Google Scholar 

  6. Rajen C (2009) 3D integration technologies—an overview. In: Lu D, Wong CP (eds) Materials for advanced packaging. Springer, New York, pp 1–50

    Google Scholar 

  7. Frank N, Adit D, Fredrik F, Niclas R, Martin L, Michael P, Fabian Z, Jörn L, Göran S (2009) Wafer bonding with nano-imprint resists as sacrificial adhesive for fabrication of silicon-on-integrated-circuit (SOIC) wafers in 3D integration of MEMS and ICs. Sens Actuators A Phys 154(1):180–186

    Article  Google Scholar 

  8. Koester SJ, Young AM, Yu RR, Purushothaman S, Chen KN, La TDCJ, Rana N, Shi L, Wordeman MR, Sprogis EJ (2008) Wafer-level 3D integration technology. IBM J Res Dev 52(6):583–597

    Article  Google Scholar 

  9. Luo SY, Wang ZW (2008) Studies of chipping mechanisms for dicing silicon wafers. Int J Adv Manuf Technol 35(11–12):1206–1218

    Article  Google Scholar 

  10. Song C, Zhang Z (2003) Dicing technology in super-thin wafer for IC. Fifth international conference on electronic packaging technology, Shanghai, China, 28-30 October, 130–132

  11. Toshiharu M, Ichiro I, Isao Y (1999) Blade wear and wafer chipping in dicing processes. Trans Jpn Soc Mech Eng C 65:801–806

    Article  Google Scholar 

  12. Kim SC, Lee ES, Kim NH, Jeong HD (2007) Machining characteristics on the ultra-precision dicing of silicon wafer. Int J Adv Manuf Technol 33(7–8):662–667

    Article  Google Scholar 

  13. Shi KW, Yow KY, Khoo R, Lo C (2009) Wafer dicing process optimization and characterization for C90 low-k wafer technology. Proceedings of the electronic packaging technology conference, Singapore, 9-11 December, 889-892

  14. Zhang ZY, Huo FW, Wu YQ, Huang H (2011) Grinding of silicon wafers using an ultrafine diamond wheel of a hybrid bond material. Int J Mach Tools Manuf 51(1):18–24

    Article  Google Scholar 

  15. Zhang ZY, Wu YQ, Guo DM, Huang H (2011) Phase transformation of single crystal silicon induced by grinding with ultrafine diamond grits. Scripta Mater 64(2):177–180

    Article  Google Scholar 

  16. Malkin S, Guo CS (2008) Grinding technology: theory and applications of machining with abrasives, 2nd edn. Industrial Press, New York, pp 54–79

    Google Scholar 

  17. Xu LM, Shen B, Shih AJ (2006) Vitreous bond silicon carbide wheel for grinding of silicon nitride. Int J Mach Tools Manuf 46(6):631–639

    Article  Google Scholar 

  18. Zhang ZY, Song YX, Xu CG, Guo DM (2012) A novel model for undeformed nanometer chips of soft-brittle HgCdTe films induced by ultrafine diamond grits. Scripta Mater 67(2):197–200

    Article  Google Scholar 

  19. Zhang ZY, Xu CG, Zhang XZ, Guo DM (2012) Mechanical characteristics of nanocrystalline layers containing nanotwins induced by nanogrinding of soft-brittle CdZnTe single crystals. Scripta Mater 67(4):392–395

    Article  Google Scholar 

  20. Zhang ZY, Song YX, Huo FW, Guo DM (2012) Nanoscale material removal mechanism of soft-brittle HgCdTe single crystals under nanogrinding by ultrafine diamond grits. Tribol Lett 46(1):95–100

    Article  Google Scholar 

  21. Zhou HX, Wang CM, Zhao DJ, Zhao HH (2012) Nanogrinding of soft-brittle monocrystalline mercury cadmium telluride using a ceramic bond ultrafine diamond grinding wheel. Int J Adv Manuf Technol 60(9–12):933–938

    Article  Google Scholar 

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Correspondence to Hongxiu Zhou.

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Zhou, H., Qiu, S., Huo, Y. et al. High-speed dicing of silicon wafers conducted using ultrathin blades. Int J Adv Manuf Technol 66, 947–953 (2013). https://doi.org/10.1007/s00170-012-4379-6

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  • DOI: https://doi.org/10.1007/s00170-012-4379-6

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