Abstract
Optical emission (180–800 nm) and mass spectroscopy have been used to study the CF4, CF4+O2, C2F6, C2F6+H2, CF3Cl, and C2F4 decomposition in radio-frequency discharges. The analysis of the stable and unstable discharge products has allowed the suggestion of decomposition channels for the various gases and to classify the fluorinated gases according to their predominant etching or polymerizing characteristics on the basis of the active species present in the plasma. A new broad emission continuum centered at λ=290 nm (FWHM=66 nm) has also been identified and it has been tentatively assigned to CF+ 2.
This is a preview of subscription content, log in via an institution to check access.
Similar content being viewed by others
References
D. L. Flamm and V. M. Donnelly,Plasma Chem. Plasma Processes.1, 317 (1981), and references therein.
E. Kray, J. Coburn, and A. Dilks, inTopics in Current Chemistry: Plasma Chemistry III, S. Veprek and M. Venugopalan, eds., Springer-Verlag, New York (1980), p. 1, and references therein.
D. L. Flamm,Plasma Chem. Plasma Processes. 1, 37 (1981).
R. Heinecke,Solid State Electron. 18, 1146 (1975); R. Heinecke,Solid State Electron. 19, 1039 (1976).
C. J. Mogab and H. J. Levenstein,J. Vac. Sci. Technol. 17, 1721 (1980).
C. J. Mogab, A. C. Adams, and D. L. Flamm,J. Appl. Phys. 49, 3796 (1978).
R. d'Agostino and D. L. Flamm,J. Appl. Phys. 52, 162 (1981).
R. d'Agostino, F. Cramarossa, S. De Benedictis, and G. Ferraro,J. Appl. Phys. 52, 1259 (1981).
R. d'Agostino, V. Colaprico, and F. Cramarossa,Plasma Chem. Plasma Process. 1, 365 (1981).
R. d'Agostino, V. Colaprico, and F. Cramarossa,Proc. 5th Intern. Symp. Plasma Chemistry (ISPC-5), August 1981, Vol. 1, Edinburgh, p. 25.
R. d'Agostino, V. Colaprico, and F. Cramarossa,Proc. XIV Congresso Nazionale Chimica Inorganica, F13, Torino, September 1981.
J. W. Coburn and M. Chen,J. Appl. Phys. 51, 3134 (1980).
J. W. Coburn and M. Chen,J. Vac. Sci. Technol. 18, 353 (1981).
V. M. Donnelly, D. L. Flamm and J. A. Mucha, in:Plasma Processing, R. G. Frieser and C. J. Mogab, eds., Electrochem. Soc. (1981), p. 270.
D. L. Flamm,J. Appl. Phys. 51, 5688 (1981).
Quach-Tat-Trung, G. Durocher, P. Sauvagean, and C. Sandorfy,Chem. Phys. Lett. 47, 404 (1977).
G. K. Vinogradov, L. S. Polak, D. I. Slovetsky, and T. V. Fedoseeva,Proc. XV Int. Conf. on Phenomena in Ionized Gases, XV ICPIG, P0620, Minsk (USSR), July 1981.
H. J. Tiller, D. Berg, and R. Mohr,Plasma Chem. Plasma Process. 1, 247 (1981).
T. Koopmans,Physica 1, 104 (1934).
L. M. Sachs, M. Geller, and J. J. Kaufmann,J. Chem. Phys. 51, 2771 (1969).
D. S. King, P. K. Schenk, and J. C. Stephenson,J. Mol. Spectrosc. 78, 1 (1979).
H. H. Van Sprang, H. H. Brongersna, and F. J. De Heer,Chem. Phys. 35, 51 (1978).
R. E. Lilnger and J. E. Greene, in:Plasma Processing, R. G. Frieser and C. J. Mogab, eds., Electrochem. Soc. (1981), p. 257.
D. L. Flamm,Solid State Technol. 22, 117 (1980).
P. Brand, and J. Kopainsky,Appl. Phys. 16, 425 (1978).
H. Niraoka, and L. W. Welsh, Jr., in:Plasma Processing, R. G. Frieser and C. J. Mogab, eds., Electrochem. Soc. (1981), p. 59.
JANAF, Thermochemical Tables, 1966 and 1967.
E. A. Truesdale, and G. Smolinsky,J. Appl. Phys. 50, 6594 (1979).
V. N. Kondratiev, Rate Constants of Gas-phase Reactions NBS-NSRDS (1972).
G. Turban, J. Pasquereau, M. Rapeaux, Y. Catherine, and B. Grolleau,3rd Symp. on Plasma Processing, Fall Meeting of the Electrochem. Soc., Denver, Colorado (1981).
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
d'Agostino, R., Cramarossa, F. & De Benedictis, S. Diagnostics and decomposition mechanism in radio-frequency discharges of fluorocarbons utilized for plasma etching or polymerization. Plasma Chem Plasma Process 2, 213–231 (1982). https://doi.org/10.1007/BF00566521
Received:
Revised:
Issue Date:
DOI: https://doi.org/10.1007/BF00566521