Abstract
This paper reports on a study of a methodology for fabrication of arbitrarily shaped silicon structures using technologies common to standard IC manufacturing processes. Particular emphasis is put on the design and use of halftone transmission masks for the lithography step required in the fabrication process of mechanical, optical or electronics components. The design and experimental investigation of gray-tone masks was supported by lithography simulation. Results are presented for both, simulated gray-tone patterns as well as experimental profiles.
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M. Hisanaga; T. Koumura; T. Hattori: Fabrication of 3-dimensionally shaped Si diaphragm dynamic focussing mirror, MEMS' 1993, p. 30
D.R. Purdy: Fabrication of complex micro-optic components using photosculpting through half-tone transmission masks, IOP Conference, Focus on Micromechanics, Warwick/UK, June 1993
G. Gal: Micro-optics technology development for advanced sensors, Proc. Diffractive and Miniaturised Optics, San Diego, July 1993
W. Döldissen; H. Engel; J. Wengelink; H.J. Hensel: Lithographic Fabrication of Integrated Microopticl Elements, Proc. European Conference on Optical Communication, ECOC 93
W. Henke; W. Hoppe; H.J. Quenzer; P. Staudt-Fischbach; B. Wagner: Simulation and Experimental Study of gray-tone Lithography for the fabrication of arbitrarily shaped surfaces, Proc. IEEE Micro Electro Mechanical Systems, (1994) pp. 205–210
Y. Oppliger;P. Sixt;J.M. Stauffer;J.M. Mayer;P. Regnault;G. Vorin: One step 3D Shaping Using a Grey-Tone Mask for Optical and Microelectronic Applications, Microelectronic Engineering 23, 1994, pp 449–454
J.W. Goodman: Introduction to Fourier Optics, McGraw-Hill, New York 1968
W. Henke;G. Czech: Simulation of lithographic images and resist profiles, Microelectronic Engineering Vol. 1, p. 629, 1990
T. Kokubo;Z. Idemoto;Y. Kawabe;K. Uenishi: Design of a positive photoresist for submicron imaging assisted by SAMPLE simulation, Proc. SPIE, Advances in resist technology and processing V, Vol. 920, 1, p. 355, 1988
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Quenzer, H.J., Henke, W., Hoppe, W. et al. Fabrication of relief-topographic surfaces with a one-step UV-lithographic process. Microsystem Technologies 1, 196–201 (1995). https://doi.org/10.1007/BF01371495
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DOI: https://doi.org/10.1007/BF01371495