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Diffraction profiles of thin film diffusion couples

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Abstract

On the basis of hypothetical thin film couples in which a grain-boundary supported diffusion process is simulated, it is shown that the concentration spectrum may contain maxima which would not occur if the process were governed by lattice diffusion only. As such maxima consequently appear in the diffraction pattern, real diffraction profiles of interdiffusion layers must be interpreted carefully, keeping in mind that diffraction peaks need not necessarily be associated with a particular phase. The thin-film diffusion system Au-Cu is chosen as an example to demonstrate experimentally the generation of diffraction maxima which must not be attributed to phase formation.

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Authors and Affiliations

  1. Austrian Research Centre Seibersdorf, A-2444, Seibersdorf, Austria

    E. Semerad

  2. Institute for Applied and Technical Physics, Technical University, A-1040, Vienna, Austria

    A. Wagendristel, P. Schattschneider & H. Bangert

Authors
  1. E. Semerad
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  2. A. Wagendristel
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  3. P. Schattschneider
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  4. H. Bangert
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Dedicated to Prof. Dr. F. Lihl on the occasion of his 75th birthday

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Semerad, E., Wagendristel, A., Schattschneider, P. et al. Diffraction profiles of thin film diffusion couples. Appl. Phys. A 26, 247–253 (1981). https://doi.org/10.1007/BF00617846

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  • DOI: https://doi.org/10.1007/BF00617846

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