Abstract
Chemical and electrochemical techniques are developed for oxidation of copper to constant thicknesses in 51 and 60 mm i.d. tubes up to 11 m in length. Comparison between these oxidation processes show the electrochemical process to be superior for this application. Differential double layer capacitance measurement of copper roughness after the oxidation indicates roughness factors between 3.2 and 9.9 depending on the thickness of the oxide. Potentiodynamic sweeps were used to investigate the mechanism of electrochemical oxidation in sodium hydroxide solutions saturated with copper containing complexes.
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Fineberg, D.J., Haynes, R., Jannett, F.J. et al. Chemical and electrochemical oxidation of copper in dielectric millimeter waveguide tubes. J Appl Electrochem 13, 177–182 (1983). https://doi.org/10.1007/BF00612479
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DOI: https://doi.org/10.1007/BF00612479