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Numerical simulation of the temperature dependence of photoluminescence in strained-Si1−xGex/Si heterostructures

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In previous work it has been shown that the decay in photoluminescence from Si/strained-Si1−xGex/Si quantum wells at temperatures over 100 K is controlled by surface recombination and that the photoluminescence intensity can be increased by over an order of magnitude by surface passivation. These results had been explained only by a simple phenomenological model, which could not explain why at high pump power density the observed luminescence was constant from 77 to 250 K. This paper uses a two-carrier heterojunction device simulator to determine the carrier profiles during optical pumping. The profiles are used to understand quantitatively luminescence as a function of temperature and pump power density without making the over-simplifying assumptions required for analytical modeling. Surface recombination velocities over 103 cm/s drastically affect the results, and Auger recombination plays an important role at high pump power density.

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Amour, A.S., Sturm, J.C. Numerical simulation of the temperature dependence of photoluminescence in strained-Si1−xGex/Si heterostructures. J Mater Sci: Mater Electron 6, 350–355 (1995). https://doi.org/10.1007/BF00125891

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