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Ionization Characteristic of Different Gases Inside Zinc Oxide Target During Sputtering Process Simulated Using SRIM Software

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Enabling Industry 4.0 through Advances in Manufacturing and Materials

Part of the book series: Lecture Notes in Mechanical Engineering ((LNME))

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Abstract

The aim of the paper is to study a distribution of ions inside a zinc oxide (ZnO) target during sputtering process using different gases. The plots of ion distribution were obtained from the simulation results using Stopping and Range of Ions in Matter (SRIM)-2013 software. Generally, the SRIM software is utilized to calculate a variety of parameters related to ion beam implantation and ion beam processing of materials. Simulation of ion beam sputtering is a necessary to analyze the ionization characteristics of different ions from different gases inside ZnO target during sputtering process for a thin film deposition. The results show that Radon, Krypton, and Xenon gases were the best gases to sputter high density of ZnO target in this simulation. The depth of ion during sputtering process is shown and discussed. The result indicates that depth of ion diffused into the target material decrease as the density of the target increases. These results are important to find suitable gases for ZnO sputtering and at the same time prolonging the target lifespan.

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Acknowledgements

The authors acknowledge Ministry of Higher Education Malaysia for the support and research funding under FRGS grant (600-IRMI/FRGS 5/3 (044/2019)). The authors would like to thank School of Electrical Engineering, College of Engineering, UiTM, and Research Management Centre (RMC) of UiTM for the contribution and support of this research.

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Authors and Affiliations

  1. NANO-ElecTronic Centre (NET), School of Electrical Engineering, College of Engineering, Universiti Teknologi MARA, 40450, Shah Alam, Selangor, Malaysia

    N. S. M. Nazri, M. H. Mamat, N. Parimon & M. Rusop

  2. NANO-SciTech Lab (NST), Center for Functional Materials and Nanotechnology, Institute of Science (IOS), Universiti Teknologi MARA, 40450, Shah Alam, Selangor, Malaysia

    M. H. Mamat, M. F. Malek & M. Rusop

  3. Faculty of Engineering, Universiti Malaysia Sabah, 88400, Kota Kinabalu, Sabah, Malaysia

    N. Parimon

  4. Faculty of Applied Sciences, Universiti Teknologi MARA, 40450, Shah Alam, Selangor, Malaysia

    M. F. Malek & M. K. Yaakob

  5. Nanotechnology Research Centre, Faculty of Science and Mathematics, Universiti Pendidikan Sultan Idris, 35900, Tanjung Malim, Perak, Malaysia

    A. B. Suriani & A. Mohamed

  6. Microelectronic and Nanotechnology–Shamsuddin Research Centre (MiNT-SRC), Faculty of Electrical and Electronic Engineering, Universiti Tun Hussein Onn Malaysia, 86400, Batu Pahat, Johor, Malaysia

    M. K. Ahmad & N. Nayan

  7. School of Physical and Chemical Sciences, B.S. Abdur Rahman Crescent Institute of Science & Technology, Vandalur, Chennai, 600048, India

    I. B. Shameem Banu & N. Vasimalai

  8. Nanorian Technologies Sdn. Bhd., No. 40, Jln Kajang Perdana 3/2, Taman Kajang Perdana, 43000, Kajang, Selangor, Malaysia

    M. Y. Ahmad

Authors
  1. N. S. M. Nazri
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  2. M. H. Mamat
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Corresponding author

Correspondence to M. H. Mamat .

Editor information

Editors and Affiliations

  1. Faculty of Manufacturing and Mechatronic Engineering Technology, Universiti Malaysia Pahang, Pekan, Pahang, Malaysia

    Amiril Sahab Abdul Sani

  2. Faculty of Manufacturing and Mechatronic Engineering Technology, Universiti Malaysia Pahang, Pekan, Pahang, Malaysia

    Muhammed Nafis Osman Zahid

  3. Faculty of Manufacturing and Mechatronic Engineering Technology, Universiti Malaysia Pahang, Pekan, Pahang, Malaysia

    Mohamad Rusydi Mohamad Yasin

  4. Faculty of Manufacturing and Mechatronic Engineering Technology, Universiti Malaysia Pahang, Pekan, Pahang, Malaysia

    Siti Zubaidah Ismail

  5. Faculty of Manufacturing and Mechatronic Engineering Technology, Universiti Malaysia Pahang, Pekan, Pahang, Malaysia

    Mohd Zairulnizam Mohd Zawawi

  6. Faculty of Manufacturing and Mechatronic Engineering Technology, Universiti Malaysia Pahang, Pekan, Malaysia

    Ahmad Rosli Abdul Manaf

  7. Faculty of Manufacturing and Mechatronic Engineering Technology, Universiti Malaysia Pahang, Pekan, Pahang, Malaysia

    Siti Nadiah Mohd Saffe

  8. Faculty of Manufacturing and Mechatronic Engineering Technology, Universiti Malaysia Pahang, Pekan, Pahang, Malaysia

    Radhiyah Abd Aziz

  9. Faculty of Manufacturing and Mechatronic Engineering Technology, Universiti Malaysia Pahang, Pekan, Pahang, Malaysia

    Faiz Mohd Turan

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Nazri, N.S.M. et al. (2022). Ionization Characteristic of Different Gases Inside Zinc Oxide Target During Sputtering Process Simulated Using SRIM Software. In: Abdul Sani, A.S., et al. Enabling Industry 4.0 through Advances in Manufacturing and Materials. Lecture Notes in Mechanical Engineering. Springer, Singapore. https://doi.org/10.1007/978-981-19-2890-1_37

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