Abstract
In order to improve the efficiency of polycrystalline silicon solar cells, the surface, the emitter and the bulk of the solar cell need to be passivated. In this paper, the combined action of surface passivation by means of a thin thermal TCA oxide, the use of hydrogen containing plasma silicon nitrides as anti-reflective coating and SiO2-Si interface-, emitter-and bulk passivation by means of a hydrogen plasma are investigated.
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© 1991 Springer Science+Business Media Dordrecht
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Coppye, J., Ghannam, M., De Schepper, P., Nijs, J., Mertens, R. (1991). The use of plasma silicon nitrides and hydrogen plasma on polycrystalline silicon solar cells. In: Luque, A., Sala, G., Palz, W., Dos Santos, G., Helm, P. (eds) Tenth E.C. Photovoltaic Solar Energy Conference. Springer, Dordrecht. https://doi.org/10.1007/978-94-011-3622-8_162
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DOI: https://doi.org/10.1007/978-94-011-3622-8_162
Publisher Name: Springer, Dordrecht
Print ISBN: 978-94-010-5607-6
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