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Microwave plasma CVD and related techniques for low pressure diamond synthesis

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Thin Film Diamond

Abstract

The current status, perspectives and bottlenecks of the major diamond deposition techniques are compared. General trends and correlations are outlined. The emphasis is on plasma-assisted, low pressure routes of diamond synthesis.

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Authors
  1. Peter K. Bachmann
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Editors and Affiliations

  1. J. J. Thomson Physical Laboratory, University of Reading, Whiteknights, Reading, RG6 2AF, UK

    Alan H. Lettington

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Bachmann, P.K. (1994). Microwave plasma CVD and related techniques for low pressure diamond synthesis. In: Lettington, A.H., Steeds, J.W. (eds) Thin Film Diamond. Springer, Dordrecht. https://doi.org/10.1007/978-94-011-0725-9_3

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  • DOI: https://doi.org/10.1007/978-94-011-0725-9_3

  • Publisher Name: Springer, Dordrecht

  • Print ISBN: 978-94-010-4312-0

  • Online ISBN: 978-94-011-0725-9

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