Photovoltaic Power Generation

1. Front Matter

   Pages i-x

   PDF

2. Amorphous Silicon Solar Cells (AMOR)

   1. A-Si Solar cells prepared by the glow discharge technique

      • J. P. M. Schmitt, S. A. Solems, G. Winterling, G. Willeke, P. Nagels, H. H. Brongersma et al.

      Pages 1-136

   2. Evaluation of promising alternative a-Si deposition methods

      • A. Christou, Marco V. Ginatta, T. A. Shamsi

      Pages 137-156

3. Thin Film Solar Cells from Alternative Materials (Alterna)

   1. High efficiency crystalline silicon thin-film solar cells

      • M. Caymax, G. Revel, A. Luque, G. Sala, D. Margadonna, Sergio Pizzini

      Pages 157-198

   2. Thin film solar cells based on II–VI and ternary chalcopyrite semiconductor materials

      • H. W. Schock, M. Saveli, J. Bougnot, S. Duchemin, V. Chen, J. C. Yoyotte et al.

      Pages 199-233

   3. III–V compound semiconductors for use in thin film cells or in monolytic multilayer cells

      • L. J. Giling, G. Borghs, L. Zanotti, C. Verie, M. Garozzo, C. Flores et al.

      Pages 234-301

4. Back Matter

   Pages 303-311

   PDF

Amorphous silicon PV panel mass production will require to mas­ ter plasma chemical deposition in terms of large sizes, cost, maintenance and all other problems related to industrialization. Since plasma deposition is a novel technique, the development of all this production related know how involves a considerable technical research effort. The major problems related to the design of a production deposi­ tion machine are the following - deposition should be uniform on very large area substrate (typical dimension 1 meter) ; - the deposited amorphous silicon should have good electronic properties (density of state of the order or less than 16 3 10 cm /eV) and very low impurities concentrations (for exam­ ple oxygen atomic concentration should idealy be less than 0. 01 %) ; - the film stress should be limited, the density of ponctual defects (particulates) should remain reasonable (less than 2 per 100 cm ) ; - dopant level control should be stable and efficient ; - silane consumption should remain reasonably efficient - financial cost being important the machine productivity should be high hence deposition rate optimized ; - downtime due to maintenance should be reduced to a minimum. We present here some results on the R&D effort addressed to the above mentioned problems. An original single chamber was designed. This machine will be made available on the market for R&D purposes by a process machine company. Finally the maintenance problem is considered. Plasma cleaning based on a fluorine containing etchant gases is studied and evaluated. 2.

• Substrat
• hydrogen
• material
• solar cell

• Commission of the European Communities, Brussels, Belgium

  R. Overstraeten, G. Caratti

Policies and ethics