Abstract
The laser chemical vapor deposition (LCVD) of platinum is studied with a cw argon ion laser near 350 nm. Deposition rates are studied in real time by measuring the laser light transmitted through the depositing metal film and the substrate. At low power densities the transmitted light decreases monotonically with time in a purely photolytic process leading to low quality films. At higher power densities two quite different time phases are observed: A slow initial photodeposition followed by a rapid pyrolytic deposition. The high power density deposits contain less impurities and show good electrical conductivity and surface adherence. The low power photolysis takes place mainly in the layers of organometallic molecules adsorbed on the surface, whereas at higher powers photolytic LCVD is a predominantly gas phase process.
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© 1988 Martinus Nijhoff Publishers
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Braichotte, D., Van Den Bergh, H. (1988). Time Resolved Measurements in the Thermally Assisted Photolytic Laser Chemical Vapor Deposition Of Platinum. In: Ehrlich, D.J., Nguyen, V.T. (eds) Emerging Technologies for In Situ Processing. NATO ASI Series, vol 139. Springer, Dordrecht. https://doi.org/10.1007/978-94-009-1409-4_9
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DOI: https://doi.org/10.1007/978-94-009-1409-4_9
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