Abstract
Analysis of silicon implanted with 5 × 1017 C+ cm−2 and 2 × 1018 C+ cm−2 and annealed at 1200 °C for 30 min, revealed that the lower dose implantation produced a substantial yield of SiC, while the higher dose implantation resulted in the formation of carbon clusters which retarded the synthesis of SiC.
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© 1997 Springer-Verlag Wien
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Berndt, P.R., Neethling, J.H., Engelbrecht, J.A.A. (1997). The Effect of Implantation Conditions on the Formation of SiC. In: Mink, J., Keresztury, G., Kellner, R. (eds) Progress in Fourier Transform Spectroscopy. Mikrochimica Acta Supplement, vol 14. Springer, Vienna. https://doi.org/10.1007/978-3-7091-6840-0_111
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DOI: https://doi.org/10.1007/978-3-7091-6840-0_111
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