Abstract
To overcome limitations of the classic drift-diffusion model, several higher-order transport models such as Stratton’s energy-balance model and Bløtekjær’s hydrodynamic model have been proposed. While for the drift-diffusion model the only transport parameter to be modeled correctly is the carrier mobility, there are many more significant parameters in higher-order models which cannot be directly taken from measurements. These parameters have to be chosen consistently, because otherwise the accuracy of the transport model cannot be properly assessed. Although a considerable number of parameter suggestions exists, it is not clear how well these models work when applied to submicron devices. Here we attempt a practical comparison as consistent as possible.
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References
M. Lundstrom, Fundamentals of Carrier Transport (Cambridge University Press, 2000).
R. Thoma et al., IEEE Trans. Electron Devices 38, 1343 ( 1991 ).
R. Stratton, Physical Review 126, 2002 (1962).
K. Bløtekjær, IEEE Trans.Electron Devices 17, 38 (1970).
C. Ringhofer, C. Schmeiser, and A. Zwirchmayer, SIAM J.Numer.Anal. 39, 1078 (2001).
T. Grasser, T. Tang, H. Kosina, and S. Selberherr, Proc.IEEE 91, 251 (2003).
T. Bordelon, X.-L. Wang, C. Maziar, and A. Tasch, Solid-State Electron. 35, 131 (1992).
T. Grasser, H. Kosina, and S. Selberherr, in Proc. Simulation of Semiconductor Processes and Devices (Boston, USA, 2003), pp. 63–66.
W. Hänsch, The Drift Diffusion Equation and its Application in MOSFET Modeling (Springer, Wien-New York, 1991).
A. M. Anile and O. Muscato, Physical Review B 51, 16728 (1995).
T. Grasser, H. Kosina, and S. Selberherr, in Proc. Simulation of Semiconductor Processes and Devices (Munich, Germany, 2004).
I. Bork, C. Jungemann, B. Meinerzhagen, and W. Engl, in Intl. Workshop on Numerical Modeling of Processes and Devices for Integrated Circuits NUPAD V (Honolulu, 1994), pp. 63–66.
T. Tang, in Semiconductor TCAD Workshop & Exhibition (Hsinchu, Taiwan, 1999), pp. 1–19.
T. Tang, X. Wang, H. Gan, and M. Leong, VLSI Design 13, 131 (2000).
C. Jungemann and B. Meinerzhagen, Hierarchical Device Simulation: The Monte-Carlo Perspective (Springer, Wien-New York, 2003).
T. Tang, S. Ramaswamy, and J. Nam, IEEE Trans.Electron Devices 40, 1469 (1993).
DESSIS-ISE, 1SE TCAD Release 9.0, ISE Integrated Systems Engineering AG, Zürich, Switzerland, 2003.
IμE, M1NIMOS-NT 2.0 User’s Guide, Institut für Mikroelektronik, Technische Universität Wien, Austria, 2002, http://www.iue.tuwien.ac.at/software/minimos-nt/software/minimos-nt.
F. Butler, A. Schenk, and W. Fichtner, J. of Comp. Electronics 2, 81 (2003).
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Grasser, T., Jungemann, C., Kosina, H., Meinerzhagen, B., Selberherr, S. (2004). Advanced Transport Models for Sub-Micrometer Devices. In: Wachutka, G., Schrag, G. (eds) Simulation of Semiconductor Processes and Devices 2004. Springer, Vienna. https://doi.org/10.1007/978-3-7091-0624-2_1
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DOI: https://doi.org/10.1007/978-3-7091-0624-2_1
Publisher Name: Springer, Vienna
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