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Occupational Phototoxicity and Photoallergy

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Handbook of Occupational Dermatology

Abstract

Chemical photosensitivity is a term that is used to describe skin disease caused by the interaction of light and an exogenously acquired chemical agent. In all such reactions, both the chemical and radiation are necessary for the response to be produced. Exposure to the chemical photosensitizer can be either through the systemic or the topical route. The mechanism of the response can be either irritant (toxic) or allergic (Table 1). Chemical photosensitivity classified into four clinical entities: photoirritant contact dermatitis (PICD), photoallergic contact dermatitis (PACD), photoallergy to a systematic agent, and phototoxicity to a systematic agent.

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Authors
  1. V. DeLeo
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Editor information

Editors and Affiliations

  1. Section of Dermatology, Finnish Institute of Occupational Health, Topeliuksenkatu 41 aA, 00250, Helsinki, Finland

    Lasse Kanerva M.D., Ph.D.

  2. Department of Occupational Dermatology, Karolinska Hospital, 117 76, Stockholm, Sweden

    Jan E. Wahlberg M.D., Ph.D.

  3. National Institute for Working Life, 117 76, Stockholm, Sweden

    Jan E. Wahlberg M.D., Ph.D.

  4. Klinik für Hautkrankheiten, Klinikum der FSU Jena, Erfurter Straße 35, 07740, Jena, Germany

    P. Elsner

  5. School of Medicine, University of California, Box 0989, Surge 100, 94143-0989, CA, San Francisco, USA

    Howard I. Maibach M.D.

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© 2000 Springer-Verlag Berlin Heidelberg

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DeLeo, V. (2000). Occupational Phototoxicity and Photoallergy. In: Kanerva, L., Wahlberg, J.E., Elsner, P., Maibach, H.I. (eds) Handbook of Occupational Dermatology. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-662-07677-4_37

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  • DOI: https://doi.org/10.1007/978-3-662-07677-4_37

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-662-07679-8

  • Online ISBN: 978-3-662-07677-4

  • eBook Packages: Springer Book Archive

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