Abstract
Epitaxial growth can be used for crystallization of thin film structures of different, metallic, semiconducting, and insulating material systems, including mixed systems like, e.g., metal—semiconductor or semiconductor-on-insulator device structures. The epitaxially grown structures may be of very high perfection, satisfying the so-called device-quality demands. They are suitable for application in many branches of the “high technology” part of electronics, mechanics and materials engineering. However, the main application areas of epilayer structures are defined by solid state electronics, optoelectronics, and photonics [3.1–5].
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Herman, M.A., Richter, W., Sitter, H. (2004). Application Areas of Epitaxially Grown Layer Structures. In: Epitaxy. Springer Series in MATERIALS SCIENCE, vol 62. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-662-07064-2_3
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DOI: https://doi.org/10.1007/978-3-662-07064-2_3
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