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Dendritic Web Growth of Silicon

  • Conference paper
Silicon Chemical Etching

Part of the book series: Crystals ((CRYSTALS,volume 8))

Abstract

The dendritic web growth process is a crystal growth technique which produces thin, long, ribbons of essentially single-crystalline material. The ribbon morphology results from an interaction of crystallographic and surface tension forces so that possible contamination from shaping dies is avoided. Growth is from a melt so that the usual solutes can be used to “dope” the crystals to the desired conductivity type and resistivity. Rejected solutes readily diffuse away from the growth front so that impurities segregate very efficiently as in Czochralski growth. The structural quality of the material is excellent so that all usual semiconductor processing techniques compatible with a (111) orientation are applicable to dendritic web material.

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Authors and Affiliations

  1. Westinghouse Research and Development Center, Pittsburgh, Pennsylvania, 15235, USA

    Raymond G. Seidensticker

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  1. Raymond G. Seidensticker
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J. Grabmaier

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© 1982 Springer-Verlag Berlin Heidelberg

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Seidensticker, R.G. (1982). Dendritic Web Growth of Silicon. In: Grabmaier, J. (eds) Silicon Chemical Etching. Crystals, vol 8. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-68765-5_2

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  • DOI: https://doi.org/10.1007/978-3-642-68765-5_2

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-642-68767-9

  • Online ISBN: 978-3-642-68765-5

  • eBook Packages: Springer Book Archive

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