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Applications of Block Copolymers in Thin Films: Nanopatterning

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Encyclopedia of Polymeric Nanomaterials

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Synonyms

Block copolymer nanolithography

Definition

One of the promising applications of block copolymers in thin films is in nanopatterning, creating periodic structures with length scales of 10–100 nm. Ordered structures (e.g., hexagonally packed dot or stripe arrays), formed by directed self-assembly of block copolymer thin films, can be transferred into a desired substrate by selectively removing block copolymer domains of one type, via either plasma (dry) etching or chemical (wet) etching, provided sufficient etch contrast can be created between the domains. Additional processing steps (material deposition and removal) can greatly expand the diversity of materials into which the pattern can be transferred; organic and inorganic materials – insulators, semiconductors, and metals, including magnetic materials – have all been effectively patterned using block copolymer templates.

Introduction

Block copolymers can form periodically ordered nanodomain structures, where the domains are...

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Author information

Authors and Affiliations

  1. Department of Chemical and Biological Engineering, Princeton University, 08544, Princeton, NJ, USA

    So Youn Kim & Richard A. Register

Authors
  1. So Youn Kim
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  2. Richard A. Register
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Corresponding author

Correspondence to Richard A. Register .

Editor information

Editors and Affiliations

  1. Center for Fiber and Textile Science, Kyoto Institute of Technology, Matsugasaki, Sakyo-ku, Kyoto, Japan

    Shiro Kobayashi

  2. Max Planck Institute for Polymer Research, Mainz, Germany

    Klaus Müllen

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Kim, S.Y., Register, R.A. (2015). Applications of Block Copolymers in Thin Films: Nanopatterning. In: Kobayashi, S., Müllen, K. (eds) Encyclopedia of Polymeric Nanomaterials. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-29648-2_63

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