Abstract
Present investigation reports the development and performance of transparent conducting electrode (TCE) having oxide-metal bilayer structure; ZnO/Ag deposited at 300 K and showing good electrical and optical properties. Low energetic ion implanted films show a variation of electrical properties; sheet resistance, carrier concentration and mobility under ion fluence variation implying tunability. A thin film of silver (8 nm) was deposited on a corning glass substrate using sputtering with a subsequent deposition of 60 nm ZnO layer. Carbon ion beam of energy 40 keV with different fluences was used to modify properties of the bilayer structure.
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Acknowledgements
Authors are grateful for various fabrication and characterization facilities provided by Materials Research Centre (MRC) at MNIT Jaipur (INDIA) and LEIBF, Inter University Accelerator Centre (IUAC), New Delhi (INDIA).
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Garg, P., Sharma, V., Surbhi, Singh, S., Sachdev, K. (2019). Effect of Carbon Ion Implantation on a Bi-Layer Transparent Electrode. In: Sharma, R., Rawal, D. (eds) The Physics of Semiconductor Devices. IWPSD 2017. Springer Proceedings in Physics, vol 215. Springer, Cham. https://doi.org/10.1007/978-3-319-97604-4_158
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DOI: https://doi.org/10.1007/978-3-319-97604-4_158
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