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Emerging Contaminants Mineralization by a Photo-Electrochemical Method Based on WO3

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Frontiers in Wastewater Treatment and Modelling (FICWTM 2017)

Part of the book series: Lecture Notes in Civil Engineering ((LNCE,volume 4))

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Abstract

WO3 absorbs light up to 470 nm and when illuminated in the presence of water generates OH radicals, which promote oxidation of organic pollutants, such as drugs. In the case of WO3 photoanodes, a considerable acceleration (4–5 times) of degradation kinetics is obtained through the application of a 1.5 V potential bias, which is instrumental to optimize the charge separation within the films and to maximize holes transfer rate to the electrolyte. Moreover, after sufficiently long irradiation, complete mineralization of the organics is achieved. Photoelectrocatalysis is observed even in diluted supporting electrolyte conditions, representing the average salinity of natural freshwater samples, demonstrating the practical feasibility of this approach.

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References

  • Bignozzi CA, Caramori S, Cristino V, Argazzi R, Meda L, Tacca A (2013) Nanostructured photoelectrodes based on WO3: applications to photooxidation of aqueous electrolytes. Chem Soc Rev 42:2228–2246

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  • Longobucco G, Pasti L, Molinari A, Marchetti N, Caramori S, Cristino V, Boaretto R, Bignozzi CA (2017, in press) Photoelectrochemical mineralization of emerging contaminants at porous WO3 interfaces. Appl Catal B: Environ

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Acknowledgements

Funding from the University of Ferrara (multidisciplinary projects-PRIA) and from Regione Emilia-Romagna (POR-FESR 2014–2020 HP-SOLAR project) are gratefully acknowledged.

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© 2017 Springer International Publishing AG

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Molinari, A., Longobucco, G., Pasti, L., Cristino, V., Caramori, S., Bignozzi, C.A. (2017). Emerging Contaminants Mineralization by a Photo-Electrochemical Method Based on WO3 . In: Mannina, G. (eds) Frontiers in Wastewater Treatment and Modelling. FICWTM 2017. Lecture Notes in Civil Engineering , vol 4. Springer, Cham. https://doi.org/10.1007/978-3-319-58421-8_54

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  • DOI: https://doi.org/10.1007/978-3-319-58421-8_54

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  • Publisher Name: Springer, Cham

  • Print ISBN: 978-3-319-58420-1

  • Online ISBN: 978-3-319-58421-8

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