Abstract
Surface passivation is directly related to the chemical structure and composition of the silicon-insulator interface. However, the chemical properties of the interface, as an essentially two-dimensional feature, are not easily measured, still less those of the various electronic states, which occupy only a small fraction of interfacial sites.
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Black, L.E. (2016). Relationship Between Al\(_{2}\)O\(_{3}\) Bulk and Interface Properties. In: New Perspectives on Surface Passivation: Understanding the Si-Al2O3 Interface. Springer Theses. Springer, Cham. https://doi.org/10.1007/978-3-319-32521-7_9
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