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Thin Film Growth in Nanostructured Materials

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Growth and Transport in Nanostructured Materials

Part of the book series: SpringerBriefs in Materials ((BRIEFSMATERIALS))

Abstract

In this chapter we focus on the impact that reactive transport and surface kinetics have on the coating of nanostructured and high surface area materials. We cover a series of approximations, including line of sight, constant reaction probability, more complex non-self limited kinetics characteristic from chemical vapor deposition, and self-limited interactions typical from atomic layer deposition. Different criteria to achieve highly conformal growth inside nanostructured or high surface area materials are introduced.

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References

  1. I.A. Blech, Thin Solid Films 6, 113 (1970)

    Article  Google Scholar 

  2. J.B. Bindell, T.C. Tisone, Thin Solid Films 23, 31 (1974)

    Article  Google Scholar 

  3. T.C. Tisone, J.B. Bindell, J. Vac. Sci. Technol. 11, 72 (1974)

    Article  Google Scholar 

  4. T.S. Cale, G.B. Raupp, T.H. Gandy, J. Appl. Phys. 68, 3645 (1990)

    Article  Google Scholar 

  5. F. Meseguer, A. Blanco, H. Miguez, F. Garcia-Santamaria, M. Ibisate, C. Lopez, Colloids Surf. A Physicochem. Eng. Aspects 202, 281 (2002)

    Article  Google Scholar 

  6. H. Miguez, E. Chomski, F. Garcia-Santamaria, M. Ibisate, S. John, C. Lopez, F. Meseguer, J.P. Mondia, G.A. Ozin, O. Toader, H.M. van Driel, Adv. Mater. 13, 1634 (2001)

    Article  Google Scholar 

  7. K.A. Arpin, M.D. Losego, A.N. Cloud, H.L. Ning, J. Mallek, N.P. Sergeant, L.X. Zhu, Z.F. Yu, B. Kalanyan, G.N. Parsons, G.S. Girolami, J.R. Abelson, S.H. Fan, P.V. Braun, Nat. Commun. 4, 2630 (2013)

    Article  Google Scholar 

  8. G.B. Raupp, T.S. Cale, Chem. Mater. 1, 207 (1989)

    Article  Google Scholar 

  9. A. Yanguas-Gil, Y. Yang, N. Kumar, J.R. Abelson, J. Vac. Sci. Technol. A 27, 1235 (2009)

    Article  Google Scholar 

  10. V. Ramachandran, M.F. Brady, A.R. Smith, R.M. Feenstra, D.W. Greve, J. Electr. Mater. 27(4), 308 (1998)

    Article  Google Scholar 

  11. W.B. Wang, J.R. Abelson, J. Appl. Phys. 116(19), 194508 (2014)

    Article  Google Scholar 

  12. W.J.B. Wang, N.N. Chang, T.A. Codding, G.S. Girolami, J.R. Abelson, J. Vac. Sci. Technol. A 32(5), 051512 (2014)

    Article  Google Scholar 

  13. A. Yanguas-Gil, N. Kumar, Y. Yang, J.R. Abelson, J. Vac. Sci. Technol. A 27(5), 1244 (2009)

    Article  Google Scholar 

  14. J.W. Elam, D. Routkevitch, P.P. Mardilovich, S.M. George, Chem. Mater. 15(18), 3507 (2003)

    Article  Google Scholar 

  15. S. Haukka, E.L. Lakomaa, O. Jylha, J. Vilhunen, S. Hornytzkyj, Langmuir 9(12), 3497 (1993)

    Article  Google Scholar 

  16. J.W. Elam, J.A. Libera, T.H. Huynh, H. Feng, M.J. Pellin, J. Phys. Chem. C 114, 17286 (2010)

    Article  Google Scholar 

  17. A. Rugge, J.S. Becker, R.G. Gordon, S.H. Tolbert, Nano Lett. 3, 1293 (2003)

    Article  Google Scholar 

  18. J.W. Elam, J.A. Libera, M.J. Pellin, A.V. Zinovev, J.P. Greene, J.A. Nolen, Appl. Phys. Lett. 89(5), 053124 (2006)

    Article  Google Scholar 

  19. Q. Peng, Y.C. Tseng, S.B. Darling, J.W. Elam, Adv. Mater. 22(45), 5129 (2010)

    Article  Google Scholar 

  20. M. Knez, K. Niesch, L. Niinisto, Adv. Mater. 19(21), 3425 (2007)

    Article  Google Scholar 

  21. A. Yanguas-Gil, J.A. Libera, J.W. Elam, ECS Trans. 64(9), 63 (2014)

    Article  Google Scholar 

  22. A. Yanguas-Gil, J.W. Elam, Chem. Vapor Depos. 18(1–3), 46 (2012)

    Article  Google Scholar 

  23. J.Y. Kim, J.H. Ahn, S.W. Kang, J.H. Kim, J. Appl. Phys. 101, 073502 (2007)

    Article  Google Scholar 

  24. J.Y. Kim, J.H. Kim, J.H. Ahn, P.K. Park, S.W. Kang, J. Electrochem. Soc. 154, H1008 (2007)

    Article  Google Scholar 

  25. J. Dendooven, D. Deduytsche, J. Musschoot, R.L. Vanmeirhaeghe, C. Detavernier, J. Electrochem. Soc. 156, P63 (2009)

    Article  Google Scholar 

  26. A. Yanguas-Gil, J.W. Elam, Theor. Chem. Acc. 133(4), 1465 (2014)

    Article  Google Scholar 

  27. A. Yanguas-Gil, J.W. Elam, ECS Trans. 41(2), 169 (2011)

    Article  Google Scholar 

  28. R.G. Gordon, D. Hausmann, E. Kim, J. Shepard, Chem. Vapor Depos. 9, 73 (2003)

    Article  Google Scholar 

  29. M.K. Gobbert, S.G. Webster, T.S. Cale, J. Electrochem. Soc. 149(8), G461 (2002)

    Article  Google Scholar 

  30. H.C.M. Knoops, E. Langereis, M.C.M. van de Sanden, W.M.M. Kessels, J. Electrochem. Soc. 157(12), G241 (2010)

    Article  Google Scholar 

  31. B.J. Wood, H. Wise, J. Phys. Chem. 65(11), 1976 (1961)

    Article  Google Scholar 

  32. Y.C. Kim, M. Boudart, Langmuir 7(12), 2999 (1991)

    Article  Google Scholar 

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Correspondence to Angel Yanguas-Gil .

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Yanguas-Gil, A. (2017). Thin Film Growth in Nanostructured Materials. In: Growth and Transport in Nanostructured Materials. SpringerBriefs in Materials. Springer, Cham. https://doi.org/10.1007/978-3-319-24672-7_4

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