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Physical and Chemical Vapor Deposition Techniques

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Growth and Transport in Nanostructured Materials

Part of the book series: SpringerBriefs in Materials ((BRIEFSMATERIALS))

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Abstract

This chapter introduces the main vapor phase deposition techniques and their ability to homogeneously coat high surface area materials: evaporation, sputtering, chemical vapor deposition, and atomic layer deposition are covered in this chapter, which focuses on those aspects that are relevant to the coating of nanostructured materials.

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Authors and Affiliations

  1. Northwestern-Argonne Institute of Science and Engineering, Northwestern University, Evanston, Illinois, USA

    Angel Yanguas-Gil

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  1. Angel Yanguas-Gil
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Correspondence to Angel Yanguas-Gil .

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Yanguas-Gil, A. (2017). Physical and Chemical Vapor Deposition Techniques. In: Growth and Transport in Nanostructured Materials. SpringerBriefs in Materials. Springer, Cham. https://doi.org/10.1007/978-3-319-24672-7_2

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