Abstract
The nano-CMOS technology scaling makes the figures of merit of a circuit, such as performance and power, extremely sensitive to uncontrollable statistical process variation (PV). In this context, multi-objective optimization algorithms and statistical analysis are essential to ensure stable manufacturing and secure high foundry yields. The CAD and Design Services group, part of the IPG R&D in STMicroelectronics, has created a consortium in order to develop, test and implement “ Methods for Advanced Multi-objective Optimization for eDFY of Complex N ano-scale Circuits”: the MAnON Project. The contribution presents the industrial and scientific project challenges, the research results, and consequent methodology enhancements and their implementation into a software prototype in order to be usable inside a nanoelectronics industrial design environment.
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© 2016 Springer International Publishing AG
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Gangemi, G., Vicari, C., Ciccazzo, A., Rinaudo, S. (2016). The MAnON Project. In: Russo, G., Capasso, V., Nicosia, G., Romano, V. (eds) Progress in Industrial Mathematics at ECMI 2014. ECMI 2014. Mathematics in Industry(), vol 22. Springer, Cham. https://doi.org/10.1007/978-3-319-23413-7_58
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DOI: https://doi.org/10.1007/978-3-319-23413-7_58
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Publisher Name: Springer, Cham
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Online ISBN: 978-3-319-23413-7
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