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Structure and Properties of B4C Coatings Obtained by RF Sputtering with External Magnetic Field

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Nanomaterials and Nanocomposites, Nanostructure Surfaces, and Their Applications

Abstract

In this research, the method of synthesizing B4C coatings in Bulat-type device by using an RF plasma source with an external magnetic field is considered, which is based on the sputtering of the cathode material by high-energy argon ions when creating plasma in a weak magnetic field.

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Correspondence to A. V. Taran or S. P. Romaniuk .

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Taran, A.V. et al. (2021). Structure and Properties of B4C Coatings Obtained by RF Sputtering with External Magnetic Field. In: Fesenko, O., Yatsenko, L. (eds) Nanomaterials and Nanocomposites, Nanostructure Surfaces, and Their Applications . Springer Proceedings in Physics, vol 246. Springer, Cham. https://doi.org/10.1007/978-3-030-51905-6_5

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