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Preparation Methods for Thin Films

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Physics of Nonmetallic Thin Films

Part of the book series: NATO Advanced Study Institutes Series ((NSSB,volume 14))

Abstract

It is possible to divide the methods of making thin layers (i.e. layers which are less than 1 µm thick) in several different ways(1) (2). One classification is in terms of the separate groups, (1) chemical methods and (2) physical methods. Physical methods cover deposition techniques which depend on the evaporation or ejection of material from a source, i.e. evaporation or sputtering, whereas chemical methods depend on a specific chemical reaction. This chemical reaction may depend on the electrical separation of ions as in electro-plating and anodisation or it may depend on thermal effects as in vapour phase deposition and thermal growth. However, in all these cases a definite chemical reaction is required to obtain the final film.

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Author information

Authors and Affiliations

  1. Department of Electronic and Electrical Engineering, University of Technology, Loughborough, Leicestershire, UK

    D. S. Campbell

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  1. D. S. Campbell
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Editor information

Editors and Affiliations

  1. Université Claude Bernard Lyon 1, Villeurbanne, France

    C. H. S. Dupuy  & A. Cachard  & 

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© 1976 Plenum Press, New York

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Campbell, D.S. (1976). Preparation Methods for Thin Films. In: Dupuy, C.H.S., Cachard, A. (eds) Physics of Nonmetallic Thin Films. NATO Advanced Study Institutes Series, vol 14. Springer, Boston, MA. https://doi.org/10.1007/978-1-4684-0847-8_2

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  • DOI: https://doi.org/10.1007/978-1-4684-0847-8_2

  • Publisher Name: Springer, Boston, MA

  • Print ISBN: 978-1-4684-0849-2

  • Online ISBN: 978-1-4684-0847-8

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