Abstract
The substitutional nitrogen impurities with the neutral charge, Ns (0), can be introduced into Si by nanosecond-pulsed laser annealing. This is due to nonequilibrium process of pulsed-laser annealing involving extremely rapid recrystallization and rapid cooling. It is found from ESR and PL results that PL lines of 0.746- and 0.767-eV are associated with Ns (0). The ESR result for doping of P shallow donors into Si:N also indicates that substitutional nitrogen impurities with a negative charge, Ns (−) are formed in pulsed-laser annealed Si:N:P system.
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Murakami, K., Itoh, H., Takita, K., Masuda, K., Nishino, T. (1985). Supersaturated Substitutional-Nitrogen Impurities in Nanosecond-Pulsed Laser Annealed Silicon. In: Chadi, J.D., Harrison, W.A. (eds) Proceedings of the 17th International Conference on the Physics of Semiconductors. Springer, New York, NY. https://doi.org/10.1007/978-1-4615-7682-2_340
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DOI: https://doi.org/10.1007/978-1-4615-7682-2_340
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