Abstract
Ambient pressure X-ray photoelectron spectroscopy (AP-XPS) is an emerging in situ spectroscopic technique which is creating a new road map in the world of surface science. AP-XPS is a powerful tool to investigate and help us to understand the electronic structures of surfaces and the chemical states of adsorbates and substrates under realistic conditions. The purpose of this report is to present the role of AP-XPS in surface science by reviewing the development and applications of AP-XPS. This chapter contains the brief history of AP-XPS, the latest progress in the instrumentation, and its recent results from noble model systems as well as practical real system in surface science. Also, the directions of future research using AP-XPS are discussed.
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Acknowledgments
The Advanced Light Source is supported by the Director, Office of Science, Office of Basic Energy Sciences, of the U.S. Department of Energy under Contract No. DE-AC02-05CH11231. We acknowledge the Grants-in-Aid for scientific research (No. 20245004) and the MEXT-Supported Program for the Strategic Research Foundation at Private Universities, 2009–2013 for financial supports. The experiments have been performed under the approval of the Advanced Light Source (ALS-02305) and the Photon Factory Program Advisory Committee (PF PAC Nos. 2008G192 and 2010G151). B.S.M. would like to thank the support by Basic Science Research Program through the NRF by the MEST (2012R1A1A2001745) and by GIST College’s 2013 GUP Research Fund.
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Mun, B.S., Kondoh, H., Liu, Z., Ross, P.N., Hussain, Z. (2014). The Development of Ambient Pressure X-Ray Photoelectron Spectroscopy and Its Application to Surface Science. In: Park, J. (eds) Current Trends of Surface Science and Catalysis., vol 1. Springer, New York, NY. https://doi.org/10.1007/978-1-4614-8742-5_9
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