Abstract
Large, asymmetric atomic relaxations are important features of oxygen-vacancy-related defects in silicon dioxide. To investigate these defects we have adapted the MIND0/3 and MOPN semiempirical molecular structure methods. In several cases (the E ′1 , E ′2 , and E ′4 centers) the defect is paramagnetic and its primary characteristic is a single sp3 electron localized on one Si and oriented towards or away from the O vacancy. Different atomic relaxations and charge states, along with the presence or absence of atomic H, distinguish these defects from one another. One important type of relaxation appears to be the displacement of a Si into a “back-bonds” interstitial position.
Access this chapter
Tax calculation will be finalised at checkout
Purchases are for personal use only
Preview
Unable to display preview. Download preview PDF.
References
A.H. Edwards and W.B. Fowler, Phys. Rev. B 26:6649 (1982).
A.H. Edwards and W.B. Fowler, J. Phys. Chem. Solids 46:841 (1985).
A.H. Edwards and W.B. Fowler, in “Structure and Bonding in Non-Crystalline Solids”, edited by G.E. Walrafen and A.G. Revesz, Plenum, New-York (1986).
J.K. Rudra, W.B. Fowler, and F.J. Feigl, Phys. Rev. Lett. 55:2614 (1985).
J.K. Rudra and W.B. Fowler, Phys. Rev. B 35:8223 (1987).
R.C. Bingham, M.J.S. Dewar, and K.H. Lo, A. Am. Chem. Soc. 97:1285 (1975).
P. Bischof, J. Am. Chem. Soc. 98:6844 (1976).
R.A. Weeks, and C.M. Nelson, J. Am. Ceram. Soc. 43:399 (1960).
D.L. Griscom, Nucl. Instrum. Methods Phys. Res. B 1:481 (1984).
R.A. Weeks, J. Appl. Phys. 27:1376 (1956).
R.A. Silsbee, J. Appl. Phys. 32:1459 (1961).
C.L. Marquardt and G.H. Sigel, IEEE Trans. Nucl. Sci. 22:2234 (1975).
P.M. Lenahan and P.V. Dressendorfer, J. Appl. Phys. 55:3495 (1984).
W.E. Carlos, Nucl. Instrum. Methods Phys. Res. B 1:383 (1984).
J. Robertson, J. Phys. C 17:L221 (1984).
F.J. Feigl, W.B. Fowler, and K.L. Yip, Solid State Commun. 14:225 (1974).
K.L. Yip and W.B. Fowler, Phys. Rev. B 11:2327 (1975).
M.G. Jani, R.B. Bussoli, and L.E. Halliburton, Phys. Rev. B 27:2285 (1983).
G. Lucovsky, Phil. Mag. B 41:457 (1980).
A.H. Edwards, W.B. Fowler, and F.J. Feigl (to be published).
O.F. Schirmer, in “The Physics of MOS Insulators” G. Lucovsky, S.T. Pantelides, and F.L. Galeener, eds, Pergamon, N.Y., (1980) p. 102.
J. Isoya, J.A. Weil, and L.E. Halliburton, J. Chem. Phys. 74:5436 (1981).
R.A. Weeks, Phys. Rev. 130: (1963).
F.J. Feigl and J.H. Anderson, J. Phys. Chem. Solids 31:575 (1970).
Author information
Authors and Affiliations
Editor information
Editors and Affiliations
Rights and permissions
Copyright information
© 1988 Plenum Press, New York
About this chapter
Cite this chapter
Fowler, W.B., Rudra, J.K., Edwards, A.H., Feigl, F.J. (1988). Theory of Oxygen-Vacancy Defects in Silicon Dioxide. In: Devine, R.A.B. (eds) The Physics and Technology of Amorphous SiO2 . Springer, Boston, MA. https://doi.org/10.1007/978-1-4613-1031-0_12
Download citation
DOI: https://doi.org/10.1007/978-1-4613-1031-0_12
Publisher Name: Springer, Boston, MA
Print ISBN: 978-1-4612-8301-0
Online ISBN: 978-1-4613-1031-0
eBook Packages: Springer Book Archive