Abstract
Ion-beam manufacturing is developing toward nanoaccuracy and nanoscale. In this regard, the concept and working principle of ion-beam manufacturing in nanoaccuracy and nanoscale are presented in this chapter. The key techniques for ion-beam manufacturing are discussed with an emphasis on their capabilities in the fabrication of micro-/nano-features. The corresponding typical applications involved in ion-beam manufacturing are provided. The recent developments in ion-beam-related instruments are given as well. Finally, the future trends for ion-beam manufacturing are predicted.
Similar content being viewed by others
References
Adams DP, Vasile MJ (2006) Accurate focused ion beam sculpting of silicon using a variable pixel dwell time approach. J Vac Sci Technol 2:836–844
Ali MY, Hung W, Fu YQ (2010) A review of focused Ion beam sputtering. Int J Precis Eng Manuf 11:157–170
Arshak K, Mihov M, Arshak A, McDonagh D, Sutton D (2004) Novel dry-developed focused ion beam lithography scheme for nanostructure applications. Microelectron Eng 73–74:144–151
Bahns JT, Imre A, Vlasko-Vlasov VK, Pearson J, Hiller JM, Chen LH, Welp U (2007) Enhanced Raman scattering from focused surface plasmons. Appl Phys Lett 91:081104
Caturla M, Rubia TD, Marqués LA, Gilmer GH (1996) Ion-beam processing of silicon at keV energies: a molecular-dynamics study. Phys Rev B Condens Matter 54:16683–16695
Chih JL, Aref T, Bezryadin A (2006) Fabrication of symmetric sub-5 nm nanopores using focused ion and electron beams. Nanotechnology 17:3264–3267
Chiu NHL, Christopoulos TK (eds) (2012) Advances in immunoassay technology. InTech. pp 180. ISBN 978-953-51-0440-7, doi:10.5772/1967
Coyne E, Zachariasse F (2008) A working method for prototyping solid immersion blazed-phase diffractive optics for near-infrared laser microscopy. J Micromech Microeng 18:045016 9pp
Ding X, Lim GC, Cheng CK, Butler DL, Shaw KC, Liu K et al (2008) Fabrication of a micro-size diamond tool using a focused ion beam. J Micromech Microeng 18:115013–115024
Ding X, Butler DL, Lim GC, Cheng CK, Shaw KC, Liu K, Fong WS, Zheng HY (2009) Machining with micro-size single crystalline diamond tools fabricated by a focused ion beam. J Micromech Microeng 19:025005
Fang FZ, Chen L (2000) Ultra-precision cutting for ZKN7 glass. CIRP Ann Manuf Technol 49/1:17–20
Fang FZ, Chen YH, Zhang XD, Hu XT, Zhang GX (2011) Nanometric cutting of single crystal silicon surfaces modified by ion implantation. CIRP Ann-Manuf Techn 60(1):527–530
Fang FZ, Venkatesh VC (1998) Diamond cutting of silicon with nanometric finish. CIRP Ann Manuf Technol 47(1):45–49
Fang FZ, Wu H, Liu YC (2005) Modeling and investigation on machining mechanism of nano-cutting monocrystalline silicon. Int J Mach Tool Manuf 45:1681–1686
Fang FZ, Wu H, Zhou W, Hu XT (2007) A study on mechanism of nano-cutting single crystal silicon. J Mater Process Technol 184:407–410
Fang FZ, Xu ZW, Hu XT (2009) Fabrication and configuration of carbon nanotube probes in atomic force microscopy. CIRP Ann Manuf Technol 58(1):455–458
Fang FZ, Xu ZW, Hu XT, Wang CT, Luo XG, Fu YQ (2010) Nano-photomask fabrication using focused ion beam direct writing. CIRP Ann Manuf Technol 59(1):543–546
Fleischmann M, Hendra PJ, McQuillan AJ (1974) Raman spectra of pyridine adsorbed at a silver electrode. Chem Phys Lett 26(2):163–166
Frey L, Lehrer C, Ryssel H (2003) Nanoscale effects in focused ion beam processing. Appl Phys A Mater Sci Process 76:1017–1023
Fu YQ, Bryan NKA (2004) Fabrication of three-dimensional microstructures by two-dimensional slice by slice approaching via focused ion beam milling. J Vac Sci Technol 22:1672–1678
Fu YQ, Liu Y, Zhou XL, Xu ZW, Fang FZ (2010) Experimental investigation of superfocusing of plasmonic lens with chirped circular nanoslits. Opt Express, 18(4):3438–3443
Fu Y, Zhou X (2010) Plasmonic lenses: A review, Plasmonics 5(3):287–310
Fujii A, Suzuki H, Yanagi K (2011) Development of measurement standards for verifying functional performance of surface texture measuring instruments. J Phys Conf Ser 311:012009
Gao TT, Xu ZW, Fang FZ, Gao WL, Zhang Q, Xu X (2012) High performance surface-enhanced Raman scattering substrates of Si-based Au film developed by focused ion beam nanofabrication. Nanoscale Res Lett 7(1):399
Giannuzzi LA, Phifer D, Giannuzzi NJ, Capuano MJ (2007) Two-dimensional and 3-dimensional analysis of bone/dental implant interfaces with the use of focused ion beam and electron microscopy. J Oral Maxillofac Surg 65:737–747
Gianola DS, Sedlmayr A, Mönig RC, Volkert A, Major RC, Cyrankowski E, Asif SAS, Warren OL, Kraft O (2011) In situ nanomechanical testing in focused ion beam and scanning electron microscopes. Rev Sci Insrum 82:063901
Gierak J (2009) Focused ion beam technology and ultimate applications. Semicond Sci Technol 24:043001
Grandfield K, Engqvist H (2012) Focused ion beam in the study of biomaterials and biological matter. Adv Mater Sci Eng 2012:841961–841966
Hernandezramirez F, Rodriguez J, Casals O, Russinyol E, Vila A et al (2006) Characterization of metal-oxide nanosensors fabricated with focused ion beam (FIB). Sens Actuators B 118(1–2):198–203
Joachim M, Giannuzzi LA, Kamino T, Joseph M (2007) TEM sample preparation and FIB-induced damage. MRS Bull 32:400–407
Kempshall BW, Schwarz SM, Prenitzer BI, Giannuzzi LA, Irwin RB, Stevie FA (2001) Ion channeling effects on the focused ion beam milling of Cu. J Vac Sci Technol B 19:749–754
Liang P, Park Y, Xiong Y, Ulin-Avila E, Wang Y, Zeng L, Xiong SM, Rho J, Sun C, Bogy DB, Zhang X (2011) Maskless plasmonic lithography at 22 nm resolution. Sci Rep 1:175
Lin YY, Liao JD, Ju YH, Chang CW, Shiau AL (2011) Focused ion beam-fabricated Au micro/nanostructures used as a surface enhanced Raman scattering-active substrate for trace detection of molecules and influenza virus. Nanotechnology 22:185308
Liu Y, Fu YQ, Zhou XL, Xu ZW, Fang FZ, Hu XT (2011) Experimental study of indirect phase tuning-based plasmonic structures for finely focusing. Plasmonics 6:227–233
Loeschner H, Fantner EJ, Korntner R, Platzgummer E, Stengl G, Zeininger M, Baglin JEE, Berger R, Brünger WH, Dietzel A, Baraton M-I, Merhari L (2002) Ion projection direct-structuring for nanotechnology applications. MRS Fall Meeting, Boston, Massachusetts
Luo XG, Ishihara T (2004) Surface plasmon resonant interference nanolithography technique. Appl Phys Lett 84(23):4780–4782
Matsui S (2006) Three-dimensional nanostructure fabrication by focused-ion-beam chemical-vapor- deposition. Microsc Microanal 12:130–131
Menard LD, Ramsey JM (2011) Fabrication of sub-5 nm nanochannels in insulating substrates using focused ion beam milling. Nano Lett 11:512–517
Michael F, Russo JR, Maazouz M, Giannuzzi LA, Chandler C, Utlaut M, Garrison BJ (2008) Gallium-induced milling of silicon: a computational investigation of focused ion beams. Microsc Microanal 14:315–320
Min Q, Santos MJL, Girotto EM, Brolo AG, Gordon R (2008) Localized Raman enhancement from a double-hole nanostructure in a metal film. Phys Chem Lett 112:15098–15101
Mitsuro K, Toshihiko I, Yoshitaka A, Koji S, Takeshi K, Noboru K, Hiroshi J (2007) Three-dimensional structural analysis of a block copolymer by scanning electron microscopy combined with a focused ion beam. J Polym Sci 45:677–683
Mori Y, Yamamura K, Sano Y (2000) The study of fabrication of the x-ray mirror by numerically controlled plasma chemical vaporization machining: development of the machine for the x-ray mirror fabrication. Rev Sci Instrum 71(12):4620–4626
Nagase T, Gamo K, Kubota T, Mashiko S (2005) Maskless fabrication of nanoelectrode structures with nanogaps by using Ga focused ion beams. Microelectron Eng 78–79:253–259
Naik JP, Prewett PD, Das K, Raychaudhuri AK (2011) Instabilities in focused ion beam-patterned Au nanowires. Microelectron Eng 88:2840–2843
Norman HLC, Theodore KC (2012) Immunoassays using artificial nanopores. In: Chiu NHL (ed) Advances in immunoassay technology. InTech, Croatia, pp 125–140
Pan L, Park Y, Xiong Y, Ulin-Avila E, Wang Y, Zeng L, Xiong S, Rho J, Sun C, Bogy D, Zhang X (2011) Maskless Plasmonic Lithography at 22 nm Resolution. Scientific Reports, 1:175
Pastewka L, Salzer R, Graff A, Altmann F, Moseler M (2009) Surface amorphization, sputter rate, and intrinsic stresses of silicon during low energy Ga+ focused-ion beam milling. Nucl Instrum Methods Phys Res, Sect B 267:3072–3075
Picard YN, Adams DP, Vasile MJ (2003) Focused ion beam-shaped microtools for ultra-precision machining of cylindrical components. Precis Eng 27:59–69
Qian HX, Zhou W, Miao JM, Lim LEN, Zeng XR (2008) Fabrication of Si microstructures using focused ion beam implantation and reactive ion etching. J Micromech Microeng 18:035003
Reo K, Takayuki H, Kazuhiro K (2005) Three-dimensional high-performance nano-tools fabricated using focused-ion-beam chemical-vapor-deposition. Nucl Instrum Methods Phys 232:362–366
Reyntjens S, Puers R (2001) A review of focused ion beam applications in microsystem technology. J Micromech Microeng 11:287–300
Sarvesh KT, Neeraj S, Vishwas NK (2008) Correlation between ion beam parameters and physical characteristics of nanostructures fabricated by focused ion beam. Nucl Instrum Methods Phys Res 266:1468–1474
Tseng AA (2004) Recent developments in micromilling using focused ion beam technology. J Micromech Microeng 14:R15–R34
Uram JD, Kevin K, Hunt AJ, Mayer M (2006) Submicrometer pore-based characterization and quantification of antibody–virus interactions. Small 2:967–972
Utke I, Moshkalev S, Russell P (2012) Nanofabrication using focused ion and electron beams: principles and applications. Oxford University Press, New York
Volkert CA, Minor AM (2007) Focused ion beam microscopy and micromachining. MRS Bull 32:389–399
Wang J, Huang L, Yuan L, Zhao LH, Feng XH, Zhang WW, Zhai LP, Zhu J (2011) Silver nanostructure arrays abundant in sub-5 nm gaps as highly Raman-enhancing substrates. Appl Surf Sci 258:3519–3523
Xia L, Wu W, Xu J, Hao Y, Wang YY (2006) 3D Nanohelix fabrication and 3D nanometer assembly by focused ion beam stress-introducing technique. In: 19th IEEE international conference on micro electro mechanical systems (MEMS 2006), pp 118–121. Istanbul, Turkey
Xu ZW, Fang FZ, Fu YQ, Zhang SJ, Han T, Li JM (2009) Fabrication of micro/nano structures using focused Ion beam implantation and XeF2 gas assisted etching. J Micromech Microeng 19:054003 9pp
Xu ZW, Fang FZ, Zhang SJ, Zhang XD, Hu XT, Fu YQ, Li L (2010) Fabrication of micro DOE using micro tools shaped with focused ion beam. Opt Express 18:8025–8032
Xu ZW, Fang FZ, Gao HF, Zhu Y, Wu W, Weckenmann A (2012) Nano fabrication of star structure for precision metrology developed by focused ion beam direct writing. CIRP Ann Manuf Technol 61:511–514
Yamamura K, Shimada S, Mori Y (2008) Damage-free improvement of thickness uniformity of quartz crystal wafer by plasma chemical vaporization machining. CIRP Ann Manuf Technol 59:567
Yamamura K, Takiguchi T, Ueda M, Deng H, Hattori AN, Zettsu N (2011) Plasma assisted polishing of single crystal SiC for obtaining atomically flat strain-free surface. CIRP Ann Manuf Technol 60:571–574
Yao N (2007) Focused ion beam systems basics and applications. Cambridge University Press, Cambridge, UK
Acknowledgments
The book’s publication is supported by the National Natural Science Foundation of China (No. 90923038, 51275559, 50935001), National Basic Research Program of China (973 Program, Grant No.2011CB706700), Ministry of Industry and Information Technology (No. 2011ZX04014-071), National High Technology Research and Development Program of China (863 Program, Grant No. 2012AA040405), and the “111” project by the State Administration of Foreign Experts Affairs and the Ministry of Education of China (Grant No. B07014).
Author information
Authors and Affiliations
Corresponding author
Editor information
Editors and Affiliations
Rights and permissions
Copyright information
© 2013 Springer-Verlag London
About this entry
Cite this entry
Fang, F., Xu, Z. (2013). State-of-the-Art for Nanomanufacturing Using Ion-Beam Technology. In: Nee, A. (eds) Handbook of Manufacturing Engineering and Technology. Springer, London. https://doi.org/10.1007/978-1-4471-4976-7_62-1
Download citation
DOI: https://doi.org/10.1007/978-1-4471-4976-7_62-1
Received:
Accepted:
Published:
Publisher Name: Springer, London
Online ISBN: 978-1-4471-4976-7
eBook Packages: Springer Reference EngineeringReference Module Computer Science and Engineering