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Chemical Vapor Deposition Processes for Boundary Lubricants

  • Reference work entry
Encyclopedia of Tribology

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Synonyms

Boundary lubricants; Coating; Hydrophobic surface treatments; Monolayer adsorption; Self-assembled monolayers for boundary lubrication; Surface adsorption in CVD; Thin film deposition

Definition

Chemical vapor deposition is a chemical process used to deposit a high purity solid material from the vapor phase and is commonly used in semiconductor-based technologies such as microelectronics and microelectromechanical systems (MEMS) for the deposition of a variety of thin films, including passivation and lubricant layers.

Scientific Fundamentals

Chemical vapor deposition (CVD) involves the deposition of a non-volatile solid material from one or more volatile, gaseous compounds via chemical reactions. The resultant solid film deposits atomistically on a suitable substrate with precise control over the growth rate and final properties of the films. To date, CVD techniques have been employed to produce a variety of films and coatings including metals, semiconductors, and organic thin...

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References

  • W.A. Bryant, The fundamentals of chemical vapour deposition. J. Mater. Sci. 12, 1285–1306 (1977)

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  • D.M. Dobkin, M.K. Zuraw, Principles of Chemical Vapor Deposition (Kluwer Academic, Dordrecht, 2003)

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  • R. Maboudian, C. Carraro, Surface chemistry and tribology of MEMS. Ann. Rev. Phys. Chem. 55, 35–54 (2004)

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  • M. Ohring, The Materials Science of Thin Films (Academic, San Diego, 1992)

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  • A. Ulman, An Introduction to Ultrathin Organic Films: From Langmuir Blodgett to Self-Assembly (Academic, San Diego, 1991)

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Author information

Authors and Affiliations

  1. Department of Chemical and Biomolecular Engineering, University of California, 106 Gilman Hall, Berkeley, CA, 94720, USA

    Brian Bush, Carlo Carraro & Prof. Roya Maboudian

Authors
  1. Brian Bush
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  2. Carlo Carraro
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  3. Prof. Roya Maboudian
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Corresponding author

Correspondence to Roya Maboudian .

Editor information

Editors and Affiliations

  1. Department of Mechanical Engineering and Center for Surface Engineering and Tribology, Northwestern University, Evanston, IL, USA

    Q. Jane Wang

  2. Department of Materials Science and Engineering and Center for Surface Engineering and Tribology, Northwestern University, Evanston, IL, USA

    Yip-Wah Chung

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Bush, B., Carraro, C., Maboudian, R. (2013). Chemical Vapor Deposition Processes for Boundary Lubricants. In: Wang, Q.J., Chung, YW. (eds) Encyclopedia of Tribology. Springer, Boston, MA. https://doi.org/10.1007/978-0-387-92897-5_239

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