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Surface and Superlattice

  • Chapter
Device Applications of Silicon Nanocrystals and Nanostructures

Part of the book series: Nanostructure Science and Technology ((NST))

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Abstract

This book chapter deals with the preparation of Si/SiO2 superlattices (SLs). It is organized in several parts dealing with the progress made in Si/SiO2 SL research with a special focus on the (1) methods developed for Si-based superlattices deposition and different parameters affecting the structural and optical properties of Si/SiO2 SLs, (2) techniques used for structural characterization of the SLs from both theoretical and experimental aspects, (3) optical properties (photoluminescence, PL and electroluminescence, EL) of the SLs, (4) examples of other Si-based SL structures, and (5) perspectives.

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Acknowledgments

The author is grateful for the permissions from Elsevier and AIP for providing useful material in this chapter. The Centre National de la Recherche Scientifique (CNRS) and the Nord-Pas-de Calais region are gratefully acknowledged for financial support.

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  1. Institut de Recherche Interdisciplinaire (IRI, USR 3078), Institut d'Electronique, de Microélectronique et de Nanotechnologie (IEMN, UMR 8520), Cité Scientifique, Avenue Poincaré—BP. 60069, Villeneuve d'Ascq, 59652, France

    Rabah Boukherroub

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  1. Department of Electrical & Electronic Engineering, Tokyo University of Agriculture and Technology, Tokyo, Japan

    Nobuyoshi Koshida

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Boukherroub, R. (2009). Surface and Superlattice. In: Koshida, N. (eds) Device Applications of Silicon Nanocrystals and Nanostructures. Nanostructure Science and Technology. Springer, Boston, MA. https://doi.org/10.1007/978-0-387-78689-6_3

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