Abstract
Effect of an applied electric field on the oxidation rate of vacuum deposited aluminium thin films were studied at room temperature in the laboratory atmosphere. Above the critical field, a negative potential applied to the film enhanced the rate of oxidation, while a positive field retarded the rate. This suggests an oxidation mechanism involving cationic diffusion. The observed change in the rate of oxidation for an applied field agrees with the Mott-Cabrera theory.
This is a preview of subscription content, log in via an institution to check access.
Similar content being viewed by others
References
Bhavani K and Vaidyan V K 1981Oxid. Met. 15 137
Boggio J E and Plumb R C 1966J. Chem. Phys. 44 1081
Cabrera N and Mott N F 1948–49Report Progr. Phys. 12 163
Cismaru D and Cismaru G D 1961Proc. I Int. Cong. of Metallic Corrosion (London) p. 194
Eley D D and Wilkinson P R 1960Proc. R. Soc. (London) 254 327
Fisher J C and Giaever I 1961J. Appl. Phys. 32 172
Hunt G L and Ritchie I M 1970Oxid. Met. 2 361
Hunt G L and Ritchie I M 1972J. Chem. Soc. Faraday Trans. I. 68 1413
Krishnamoorthy P K and Sircar S C 1968Acta Metall. 16 1461
Moore W J 1952Philos. Mag. 43 688
Ritchie I M and Hunt G L 1969Surf. Sci. 15 524
Shein F, Le Bouncher B and Lacompe P 1961CR Acad. Sci. (Paris) 252 4157
Uhlig H H and Brenner A E 1955Acta Metall. 3 108
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Bhavani, K., Vaidyan, V.K. Effect of an electric field on the oxidation of aluminium at room temperature. Bull. Mater. Sci. 2, 265–270 (1980). https://doi.org/10.1007/BF02802063
Received:
Revised:
Issue Date:
DOI: https://doi.org/10.1007/BF02802063