Abstract
The available methods for measuring diffusion rates of various metalloids in metallic glasses are critically reviewed, and the advantages of studying boron diffusion by secondary-ion mass spectrometry (SIMS) set out.
A surface coating of chemical composition similar to that of the glass but enriched in 10B was deposited on the polished, preannealed, glass by sputtering in an ultra-clean environment. The samples were diffusion-annealed and profiled by SIMS. Subsequent tests showed that some samples had partly crystallized and these had anomalously low diffusion rates. In the range between 340 and 370° C, D for boron varied between about 2×10−19 and 7×10−18 m2 sec−1. The values did not obey an Arrhenius relationship.
It is concluded that the method is feasible, and a number of improvements in technique are proposed in the light of experience.
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Cahn, R.W., Evetts, J.E., Patterson, J. et al. Direct measurement by secondary-ion mass spectrometry of self-diffusion of boron in Fe40Ni40B20 glass. J Mater Sci 15, 702–710 (1980). https://doi.org/10.1007/BF00551737
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DOI: https://doi.org/10.1007/BF00551737