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Oxidation and Diffusion in Ti-Al-(Mo, Nb) Intermetallics

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Abstract

The oxidation resistance of Ti-Al intermetallics is superior to many of their counterparts at high temperatures. High-temperature stability of these intermetallics appears to improve with a ternary alloying addition such as Mo, Nb, etc. A detailed analysis of oxidation of the Ti3Al intermetallics, Ti3Al-2.9 at. pct Mo and Ti3Al-1.1 at. pct Nb, in pure oxygen using crystallographic and microscopic techniques is presented here. The alloy containing 1.1 at. pct Nb did not show an improvement in oxidation resistance over the base alloy but that containing 2.9 at. pct Mo showed marked resistance to oxidation. Activation energies of oxidation for both the alloys were comparable with those reported in the literature for similar compositions. TiO2 and Al2O3 were the major phases present in the oxide scales of the oxidized alloys. The crystal orientations from the X-ray diffraction (XRD) patterns and the morphologies from scanning electron microscopy (SEM) were in good agreement and were helpful in further analysis of the oxidation process. The effective diffusion of oxygen in the oxide layers was calculated using the mole fraction of individual oxide and the diffusivity of oxygen in pure oxide. The activation energy for the effective diffusion of oxygen through the oxide layers was determined to be ~24 kJ/mol. The activation energy for the oxidation process was higher than that of the diffusion of oxygen. Hence, it can be concluded that the oxidation process in both the alloys studied is not diffusion controlled.

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Acknowledgments

The authors are pleased to acknowledge the financial support for this research by the National Science Foundation, Grant Nos. DMR-0312172 and DMR-9696112, and The University of Alabama.

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Authors and Affiliations

  1. Department of Metallurgical and Materials Engineering, The University of Alabama, Tuscaloosa, AL, 35487, USA

    M. Ramachandran (Graduate Students), D. Mantha (Research Engineer), C. Williams (Graduate Students) & R. G. Reddy (ACIPCO Professor)

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  1. M. Ramachandran
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  2. D. Mantha
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  3. C. Williams
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  4. R. G. Reddy
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Correspondence to R. G. Reddy.

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Manuscript submitted July 1, 2009.

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Ramachandran, M., Mantha, D., Williams, C. et al. Oxidation and Diffusion in Ti-Al-(Mo, Nb) Intermetallics. Metall Mater Trans A 42, 202–210 (2011). https://doi.org/10.1007/s11661-010-0440-y

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