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Characterization of oxide films formed on Alloy 600 and Alloy 690 in simulated PWR primary water by using hard X-ray photoelectron spectroscopy

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Abstract

Oxide films on Alloy 600 and Alloy 690 formed during exposure to the simulated primary side water of a pressurized water reactor were characterized using hard X-ray photoelectron spectroscopy. The specimens were immersed in a solution containing 500 ppm B + 2 ppm Li with or without dissolved hydrogen at 320 or 360 °C for 24 h. Photoelectrons generated in the oxide films with thickness up to 25 nm and in the substrate alloy underneath the oxide films could be observed simultaneously without any destructive techniques such as sputtering. The oxide films were composed of an inner oxide layer of mainly Cr and a covering hydroxide layer of Ni and Cr, with needle-like oxides distributed on the outermost surface. In addition, alloyed Cr was depleted from the substrate alloy directly underneath the oxide layer. Even though the Ni-based alloys examined were mainly composed of Ni, almost no Ni oxide was present in the oxide films formed in solution with dissolved hydrogen. Most of Ni was incorporated as hydroxide. However, Cr was incorporated both in the hydroxide and the inner oxide layers.

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Acknowledgments

This work was supported by the Priority Assistance of the Formation of Worldwide Renowned Centers of Research-Global COE Program “Center of Excellence for Advanced Structural and Functional Materials Designs” of the Ministry of Education, Sports, Culture, Science and Technology of Japan. The HAX-PES experiments were performed at the BL46 of SPring-8 with the approval of the Japan Synchrotron Radiation Research Institute (JASRI, project number 2009B1863).

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Author notes

  1. Whee-Sung Kim

    Present address: SK Innovation Co. Ltd., Daejeon, Korea

  2. Jin-Young Son

    Present address: Japan Atomic Energy Agency, Sayo-gun, Hyogo, Japan

  3. Masatake Machida

    Present address: VG Scienta Co., Tokyo, Japan

Authors and Affiliations

  1. Division of Materials and Manufacturing Science, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka, 565-0871, Japan

    Shinji Fujimoto, Whee-Sung Kim, Ki-Taek Jung & Hiroaki Tsuchiya

  2. Japan Synchrotron Radiation Research Institute, 1-1-1, Kouto, Sayo-cho, Sayo-gun, Hyogo, 679-5198, Japan

    Masugu Sato, Jin-Young Son & Masatake Machida

Authors
  1. Shinji Fujimoto
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  2. Whee-Sung Kim
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  3. Masugu Sato
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  5. Masatake Machida
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  7. Hiroaki Tsuchiya
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Correspondence to Shinji Fujimoto.

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Fujimoto, S., Kim, WS., Sato, M. et al. Characterization of oxide films formed on Alloy 600 and Alloy 690 in simulated PWR primary water by using hard X-ray photoelectron spectroscopy. J Solid State Electrochem 19, 3521–3531 (2015). https://doi.org/10.1007/s10008-015-2817-8

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