The Japan Society of Applied Physics

[C-4-4] A Simple Method to Fabricate Double-Gate SOI MOSFET with Diffusion Layer on Bulk Silicon Wafer as the Bottom Gate

Xinnan Lin, Chuguang Feng, Shengdong Zhang, Wai-Hung Ho, Mansun Chan (1.Department of Electrical and Electronic Engineering, Microelectronics Fabrication Facility Hong Kong University of Science & Technology)

https://doi.org/10.7567/SSDM.2001.C-4-4