Abstract
We proposed a simple method to fabricate a Ni–W electroformed mold for glass micro-press molding. For example, borosilicate glass (D263) was molded using the Ni–W electroformed mold. A Ni–W electroformed mold with a fine line was fabricated by photolithography and electroforming technology. Additionally, the Ni–W electroformed mold did not require a release layer. As the result of molding D263 at 883 K, the minimum pitch of the glass pattern was the same as that of the Ni–W electroformed mold. We argue that the crystallization of amorphous Ni–W occurred with the activation energy derived from the heating of micro-press molding. The heating temperature was 833 K. Additionally, the release characteristics of a Ni–W film were improved by increasing the percentage of W. In terms of the thermochemical stability and high content rate of W, we indicated that Ni–W electroformed molds can be used repeatedly for glass micro-press molding.