Fabrication and Application of Nanostructures Using Gas-Assisted Hot Embossing and Self-Assembled Nanospheres

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Abstract:

We develop a simple and competitive fabrication of antireflective (AR) films with high-ordered nanostructure arrays on polycarbonate (PC) substrate by using gas-assisted hot embossing and a self-assembled technique. In this method, a self-assembled monolayer of polystyrene (PS) nanospheres is well-patterned on glass substrates as the first template. Subsequently, we use the plasma sputtering to deposit a conductive layer onto the surface of nanosphere (NS) patterned substrates, and then, electroforming is applied to fabricate a nickel mold with an inverse shape of nanospheres. In the last step, a unique glass transition is utilized to duplicate nanostructures on PC films via gas-assisted hot embossing. Not only in visible light but in near infrared, the optical properties of this AR film are similar or better than for other methods. This fabrication process also has great potential in industry, with its simplicity, large-area but low-cost.

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399-403

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August 2015

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[1] K. Choi, S. H. Park, Y. M. Song, Y. T. Lee, C. K. Hwangbo, H. Yang and H. S. Lee, Nano-tailoring the surface structure for the monolithic high-performance antireflection polymer film, Adv. Mater. (2010) 22 3713-18.

DOI: 10.1002/adma.201001678

Google Scholar

[2] Y. Xia, J. A. Rogers, K. E. Paul, and G. M., Whitesides Unconventional Methods for Fabricating and Patterning Nanostructures, Chem. Rev. (1999) 99 1823-48.

DOI: 10.1021/cr980002q

Google Scholar

[3] H. Masuda, M. Satoh, Fabrication of gold nanodot array using anodic porous alumina as an evaporation mask, Jpn. J. Appl. Phys. (1996) Part 2: Letters 35 L126-129.

DOI: 10.1143/jjap.35.l126

Google Scholar

[4] J. J. Dumond, K. A. Mahabadi, Y. S. Yee, Tan C , J. Y. Fuh H, H. P. Lee and H. Y. Low, High resolution UV roll-to-roll nanoimprinting of resin moulds and subsequent replication via thermal nanoimprint lithography, Nanotechnology (2012).

DOI: 10.1088/0957-4484/23/48/485310

Google Scholar

[5] S. H. Ahn and L. J. Guo, Large-Area Roll-to-Roll and Roll-to-Plate Nanoimprint Lithography: A Step toward High-Throughput Application of Continuous Nanoimprinting, ACS Nano (2009) 3 (8) 2304–2310.

DOI: 10.1021/nn9003633

Google Scholar

[6] S.J. Liu and W.A. Chen, Nanofeatured anti-reflective films manufactured using hot roller imprinting and self-assembly nanosphere lithography, Optics & Laser Technology, (2013) 48 226-234.

DOI: 10.1016/j.optlastec.2012.10.033

Google Scholar

[7] F. Iskandar, M. Abdullah, H. Yoden and K. Okuyama, Optical band gap and ultralow dielectric constant materials prepared by a simple dip coating process, Journal of Applied Physic, (2003) 93 9237-9242.

DOI: 10.1063/1.1571218

Google Scholar

[8] Y. Wu, C. Zhang, Y. Yuan, Z. Wang, W. Shao, H. Wang and X Xu, Fabrication of Wafer-Size Monolayer Close-Packed Colloidal Crystals via Slope Self-Assembly and Thermal Treatment, Langmuir, (2013) 29 (46) 14017–14023.

DOI: 10.1021/la402652t

Google Scholar