A Method to Fabricate Thin Micro Silicon Cantilever Based on Optical Lithography with AZ 1518

Chen Zhi Tang

doi:10.4028/www.scientific.net/KEM.645-646.1093

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HomeKey Engineering MaterialsKey Engineering Materials Vols. 645-646A Method to Fabricate Thin Micro Silicon...

A Method to Fabricate Thin Micro Silicon Cantilever Based on Optical Lithography with AZ 1518

Abstract:

AZ 1518 is a standard thin positive photoresist in AZ1500series which has been widely used in photolithography process, beside this, as a perfect semiconductor material, micro sized silicon cantilevers have been widely used in micro electromechanical systems (MEMS). In This paper, we have presented the process of fabricate micro silicon cantilever, including the selection of the photoresist, developer and substrate, optical lithography method and PLD method. After these, AFM is used to study the cantilever pattern and the angle of inclined planes. The research results show the exposure time and experimental environment can significantly influent the quality of cantilever pattern.

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Periodical:

Key Engineering Materials (Volumes 645-646)

Pages:

1093-1098

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.645-646.1093

Citation:

Cite this paper

Online since:

May 2015

Authors:

Chen Zhi Tang*

Keywords:

AFM, Photo Lithography, Silicon Cantilever

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* - Corresponding Author

References

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