Tribological Behaviors of W-Doped DLC Films

Zhi Qiang Fu; Cheng Biao Wang; Xiu Jun Du; Zhi Jian Peng; Xiang Yu; Song Sheng Lin; Ming Jiang Dai

doi:10.4028/www.scientific.net/KEM.434-435.474

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HomeKey Engineering MaterialsKey Engineering Materials Vols. 434-435Tribological Behaviors of W-Doped DLC Films

Tribological Behaviors of W-Doped DLC Films

Abstract:

W-doped DLC films were synthesized from CH4 and W by ion beam deposition and magnetron sputtering, and the influence of W target current on the surface morphology and the mechanical properties of W-doped DLC films deposited were studied. The W-doped DLC films in the study have a smooth dense surface with several particles of about 2micron. The hardness, the modulus, and the film-substrate adhesion of the films are increased with the rise of W target current and the critical load of the scratch test for all the W-doped DLC films is above 70N. The friction coefficient of W-doped DLC films is increased with the increase of W target current while the lowest wear rate is obtained when W target current is 1A.

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Periodical:

Key Engineering Materials (Volumes 434-435)

Pages:

474-476

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.434-435.474

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Online since:

March 2010

Authors:

Zhi Qiang Fu, Cheng Biao Wang, Xiu Jun Du, Zhi Jian Peng, Xiang Yu, Song Sheng Lin, Ming Jiang Dai

Keywords:

Ion Beam Deposition, Magnetron Sputtering, W-Doped DLC Films

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