[1]
Jones, M. I., McColl I. R. GrantD. M., eta. l Effect of substrate preparation and deposition conditions on the preferred orientation ofTiN coatings deposited byRF reac-tive sputtering [J]. Surface and Coatings Technology, 2000, Vo. l 132(2-3): 143-151.
DOI: 10.1016/s0257-8972(00)00867-7
Google Scholar
[2]
H.H. Huang, M.H. Hon. Effect of N addition on growth and properties of 2 titanium nitride films obtained by atmospheric pressure chemical vapor deposition[J]. Thin Solid Films, 416 (2002) 54-61.
DOI: 10.1016/s0040-6090(02)00606-5
Google Scholar
[3]
Farkas,N. The role of subsurface oxygen in the local oxidation of zirconium and zirconium nitride thin films. Thin Solid Films, v 447-448, 30 Jan. 2004: 468-473.
DOI: 10.1016/s0040-6090(03)01252-5
Google Scholar
[4]
Zhang. High temperature erosion resistant property of ZrN. Cailiao Gongcheng/Journal of Materials Engineering, 1998(7): 27-29.
Google Scholar
[5]
Wen-Jun Chou Corrosion resistance of ZrN films on AISI 304stainless steel substrate. Surface&Coatings Technology, v 167, n1, 1 April 2003: 59~67.
DOI: 10.1016/s0257-8972(02)00882-4
Google Scholar
[6]
JONES M I, MCCOLL I R, GRANT D M, et al. Effect ofsubstrate preparation and deposition conditions on the pre-ferred orientation of TiN coatings deposited by RF reactivesputtering[J]. Surface and Coatings Technology, 2000, 132(2/3): 143-151.
DOI: 10.1016/s0257-8972(00)00867-7
Google Scholar
[7]
OU K L. Integrity of copper-hafnium, hafnium nitride and muhilayered amorphouslike hafnium nitride metal-lization un-der various thickness[J]. Microelectronic Engineering, 2006 , 83(2): 312-318.
DOI: 10.1016/j.mee.2005.09.008
Google Scholar
[8]
W J. Meng,GL. Eesley. Growth andmechanical anisotropy of TiN thin films[J]. Thin Solid Films, 271(1995) 108-116.
DOI: 10.1016/0040-6090(95)06875-9
Google Scholar
[9]
Youl-Moon Sung, Hee-Je Kim. Optimumsubstrate bias condition for TiN thin filmdeposition using anECR sputter system[J]. Surface and Coatings Technology, 171 (2003) 75-82.
DOI: 10.1016/s0257-8972(03)00241-x
Google Scholar
[10]
Da-Yung Wang, Ming-Chieh Chiu. Characterization of TiN coatings post-treated by metal-plasma ion implantation process[J]. Surface and Coatings Technology, 156 (2002) 201-207.
DOI: 10.1016/s0257-8972(02)00086-5
Google Scholar