Variations in the Measured Carrier Lifetimes of n- 4H-SiC Epilayers

Paul B. Klein; Joshua D. Caldwell; Amitesh Shrivastava; Tangali S. Sudarshan

doi:10.4028/www.scientific.net/MSF.600-603.489

Paper Titles

Origin of Giant Step Bunching on 4H-SiC (0001) Surfaces
p.473

Enhanced Annealing of the Main Lifetime Limiting Defect in Thick 4H-SiC Layers
p.477

Impact of 4H-SiC Substrate Defectivity on Epilayer Injected Carrier Lifetimes
p.481

Generation and Recombination Carrier Lifetimes in 4H SiC Epitaxial Wafers
p.485

Variations in the Measured Carrier Lifetimes of n^- 4H-SiC Epilayers
p.489

Investigation of the Internal Carrier Distribution in 4H-SiC Pin-Diodes by Laser Absorption Experiments
p.493

Computational Evaluation of Electrical Conductivity on SiC and the Influence of Crystal Defects
p.497

Characterization of Electrical Properties in SiC Crystals by Raman Scattering Spectroscopy
p.501

Raman Characteristics of Poly 3C-SiC Thin Films Deposited on AlN Buffer Layer
p.505

HomeMaterials Science ForumMaterials Science Forum Vols. 600-603Variations in the Measured Carrier Lifetimes of n-...

Variations in the Measured Carrier Lifetimes of n^- 4H-SiC Epilayers

Abstract:

The effects of measurement technique and measurement conditions (injection level, temperature) on the measured carrier lifetimes in n- 4H-SiC epilayers are investigated. For three optical measurement techniques, it is shown that the high and low injection lifetimes can vary dramatically. Differences in the lifetime for varying injection level and temperature are approached both experimentally and via carrier dynamics simulations, assuming Z1/Z2 as the dominant defect. Reasonable agreement between measured and calculated behavior is obtained, as is insight into the recombination kinetics associated with the lifetime limiting defect.