Surface Crystallization and Magnetization Reversal Processes in Amorphous Microwires

Cover Page

Cite item

Full Text

Open Access Open Access
Restricted Access Access granted
Restricted Access Subscription Access

Abstract

The bulk-inhomogeneous crystallization of amorphous microwires of composition Fe73.8Cu1Nb3.1B9.1Si13 has been studied. An assumption was put forward about the influence of the non-uniform distribution of tensile and compressive stresses in the bulk of microwires on their crystallization. It has been established that at the initial stages of crystallization the crystallization occurs in the near-surface region of a microwire with a thickness of about 2.5 μm. It has been established that the sizes of nanocrystals in the surface region of microwire are about 10 nm. It was found that the formation of an amorphous nanocrystalline layer on the microwire surface leads to an increase in the Mr/MS ratio (ratio of remanent magnetization to saturation magnetization), which is associated with a decrease in the magnetic anisotropy due to a decrease in the stress level during heat treatment and nanocrystallization. Chemical etching of annealed microwires leads to a significant increase in the Mr/MS ratio, which is due to an increase in the relative volume of the central domain layer. The results obtained indicate the potential for creating composite amorphous-nanocrystalline structures based on microwires. In the case of microwires of Fe73.8Cu1Nb3.1B9.1Si13 composition, the predominant crystallization of the surface layer can increase the effect of the giant magnetic impedance. Such objects may have potential applications in sensorics, in particular, in magnetic field and strain sensors.

About the authors

O. I. Aksenov

Institute of Solid State Physics

Author for correspondence.
Email: oleg_aksenov@inbox.ru
Russia, Chernogolovka, Moscow Region,142432

A. A. Fuks

Institute of Solid State Physics; National Research University Higher School of Economics

Email: oleg_aksenov@inbox.ru
Russia, Chernogolovka, Moscow Region,142432; 105066 Russia, Moscow

G. E. Abrosimova

Institute of Solid State Physics

Email: oleg_aksenov@inbox.ru
Russia, Chernogolovka, Moscow Region,142432

D. V. Matveev

Institute of Solid State Physics

Email: oleg_aksenov@inbox.ru
Russia, Chernogolovka, Moscow Region,142432

A. S. Aronin

Institute of Solid State Physics

Email: oleg_aksenov@inbox.ru
Russia, Chernogolovka, Moscow Region,142432

References

  1. Greer A.L., Cheng Y.Q., Ma E. // Mater. Sci. Eng. 2013. V. R74. P. 71. https://doi.org/10.1016/j.mser.2013.04.001
  2. Постнова Е.Ю., Абросимова Г.Е., Аронин А.С. // Поверхность. Рентген., синхротр. и нейтрон. исслед. 2021. № 11. С. 5.
  3. Абросимова Г.Е., Аронин А.С. // Поверхность. Рентген., синхротр. и нейтрон. исслед. 2018. № 5. С. 91.
  4. Glezer A.M., Khriplivets I.A., Sundeev R.V., Louzguine-Luzgin D.V., Pogozhev Yu.S., Rogachev S.O., Bazlov A.I., Tomchuk A.A. // Mater. Let. 2020. V. 281. P. 128659. https://doi.org/10.1016/j.matlet.2020.128659
  5. Inoue A., Ochiai T., Horio Y., Masumoto T. // Mater. Sci. Eng. 1994. V. A179/A180. P. 649. https://doi.org/10.1016/0921-5093(94)90286-0
  6. Louzguine D.V., Inoue A. // J. Non-Cryst. Solids. 2002. V. 311. P. 281. https://doi.org/10.1016/S0022-3093(02)01375-3
  7. Yavari A. R., Georgarakis K., Antonowicz J., Stoica M., Nishiyama N., Vaughan G., Chen M., Pons M. // Phys. Rev. Lett. 2012. V. 109. P. 085501. https://doi.org/10.1103/PhysRevLett.109.085501
  8. Chiriac H., Ovari T.A., Pop G. // Phys. Rev. B 1995. V. 52. P. 10104. https://doi.org/10.1103/PhysRevB.52.10104
  9. Herzer G. // Phys. Scr. 1993. V. 49. P. 307. https://doi.org/10.1088/0031-8949%2F1993%2FT49A% 2F054
  10. Chiriac H., Ovari T.A. // ProgMater Sci. 1996. V. 40. P. 333. https://doi.org/10.1016/S0079-6425(97)00001-7
  11. Fuks A., Abrosimova G., Aksenov O., Churyukanova M., Aronin A. // Crystals. 2022. V. 12. P. 1494. https://doi.org/10.3390/cryst12101494
  12. Talaat A., Zhukova V., Ipatov M., Blanco J.M., Gonzalez-Legarreta L., Hernando B., del Val J.J., González J., Zhukov A. // J. Appl. Phys. 2014. V. 115. P. 17A313. https://doi.org/10.1063/1.4863484
  13. Corte-León P., Zhukova V., Ipatov M., Blanco J.M., Gonzalez J., Zhukov A. // Intermetallics. 2019. V. 105. P. 92. https://doi.org/10.1016/j.intermet.2018.11.013
  14. Gonzalez A., Zhukova V., Corte-Leon P., Chizhik A., Ipatov M., Blanco J. M., Zhukov A. // Sensors. 2022. V. 22. № 3. P. 1053. https://doi.org/10.3390/s22031053
  15. Churyukanova M., Kaloshkin S., Shuvaeva E., Mitra A., Panda A.K., Roy R.K., Murugaiyan P., Corte-Leon P., Zhukova V., Zhukov A. // J. Magn. Magn. Mater. 2019. V. 492. P. 165598. https://doi.org/10.1016/j.jmmm.2019.165598
  16. Zhukov A., Ipatov M., Corte-León P., Gonzalez- Legarreta L., Churyukanova M., Blanco J.M., Gonzalez J., Taskaev S., Hernando B., Zhukova V. // J. Alloys Compd. 2020. V. 814. P. 152225. https://doi.org/10.1016/j.jallcom.2019.152225
  17. Clavaguera N., Pradell T., Jie Z., Clavaguera-Mora M.T. // Nanostruct. Mater. 1995. V. 6. P. 453. https://doi.org/10.1016/0965-9773(95)00094-1
  18. Abrosimova G.E., Aronin A.S., Kholstinina N.N. // Phys. Solid State. 2010. V. 52. P. 445.
  19. Chizhik A., Stupakiewicz A., Zhukov A., Maziewski A., Gonzalez J. // IEEE Trans. Magn. 2015. V. 51. P. 200234. https://doi.org/10.1109/INTMAG.2015.7157157
  20. Chen D.M., Xing D.W., Qin F.X., Liu J.S., Wang H., Wang X.D., Sun J.F. // Phys. Status Solidi. A. 2013. V. 210. P. 2515. https://doi.org/10.1002/pssa.201329246
  21. Usov N., Antonov A., Dykhne A., Lagarkov A. // J. Magn. Magn. Mater. 1997. V. 174. P. 127. https://doi.org/10.1016/S0304-8853(97)00130-3
  22. Chiriac H., Ovari T.A., Pop G. // J. Magn. Magn. Mater. 1996. V. 157. P. 227. https://doi.org/10.1016/S0079-6425(97)00001-7S0079642597000017

Supplementary files

Supplementary Files
Action
1. JATS XML
2.

Download (40KB)
3.

Download (183KB)
4.

Download (792KB)
5.

Download (811KB)
6.

Download (82KB)

Copyright (c) 2023 О.И. Аксенов, А.А. Фукс, Г.Е. Абросимова, Д.В. Матвеев, А.С. Аронин

This website uses cookies

You consent to our cookies if you continue to use our website.

About Cookies