Low resistivity transparent conductive coating consisting of AlN/Ag/AlN nano-multilayer film was fabricated using New Magnetic Hollow-Cathode V-type Sputtering Systems.
The electrical and optical properties of multilayer films have been examined. A minimum sheet resistance of less than 10 Ohm/sq. and a maximum transmittance of >90% were obtained for AlN (40 nm)/Ag (10 nm)/AlN (40 nm) on Polyethylene terephthalate substrate.
